SCHEMBL915529

SCHEMBL915529

CCOP(=O)(O)Cc1ccc(S(=O)(=O)c2ccc(OCCO)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.44
NPSR1 Q6W5P4 1/20 0.44
MMP2 P08253 4/20 0.40
MMP9 P14780 4/20 0.40
MMP13 P45452 3/20 0.40
ALDH1A1 P00352 3/20 0.39
NR1I2 O75469 1/20 0.39
MMP8 P22894 2/20 0.39
MMP1 P03956 1/20 0.39
MMP3 P08254 1/20 0.39
MMP7 P09237 1/20 0.39
MMP14 P50281 1/20 0.39
CA12 O43570 3/20 0.38
CA1 P00915 3/20 0.38
CA2 P00918 3/20 0.38
CA7 P43166 3/20 0.38
CA9 Q16790 3/20 0.38
TSHR P16473 2/20 0.38
LMNA P02545 3/20 0.38
KMT2A Q03164 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914815 0.91 NR1I2 (0.46) GAAALDH1A1NR1I2LMNAKMT2A
SCHEMBL915546 0.90 GAA (0.44) GAANPSR1MMP2MMP9MMP13
SCHEMBL4440816 0.90 GAA (0.46) GAANPSR1MMP2MMP9MMP13
SCHEMBL915282 0.88 S1PR1 (0.46) GAAMMP2MMP9MMP13ALDH1A1
SCHEMBL915696 0.87 PTPN1 (0.43) GAAALDH1A1NR1I2LMNAKMT2A
SCHEMBL916357 0.87 NR1I2 (0.43) GAAALDH1A1NR1I2LMNAKMT2A
SCHEMBL914795 0.85 ALDH1A1 (0.44) GAANPSR1MMP2MMP9MMP13
SCHEMBL914605 0.83 NR1I2 (0.40) GAANPSR1MMP2MMP9ALDH1A1
SCHEMBL914845 0.83 GAA (0.55) GAANPSR1ALDH1A1NR1I2LMNA
SCHEMBL915509 0.82 SMN1; SMN2 (0.46) GAAALDH1A1NR1I2LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed