SCHEMBL914845

SCHEMBL914845

CCOP(=O)(O)Cc1ccc(C(=O)c2ccc(OCCO)cc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.55
NR1I2 O75469 1/20 0.47
L3MBTL1 Q9Y468 3/20 0.44
LMNA P02545 3/20 0.44
MAPK1 P28482 1/20 0.44
KMT2A Q03164 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
ALDH1A1 P00352 3/20 0.41
MAPT P10636 3/20 0.41
HTT P42858 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
RAB9A P51151 2/20 0.41
CYP19A1 P11511 2/20 0.41
S1PR1 P21453 1/20 0.41
HDAC1 Q13547 1/20 0.41
PLK1 P53350 1/20 0.40
BCHE P06276 1/20 0.40
ACHE P22303 1/20 0.40
PPARG P37231 3/20 0.40
LSS P48449 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914815 0.92 NR1I2 (0.46) GAANR1I2L3MBTL1LMNAMAPK1
SCHEMBL915137 0.90 L3MBTL1 (0.47) GAAL3MBTL1LMNAMAPK1KMT2A
SCHEMBL4450708 0.89 KMT2A (0.46) GAAL3MBTL1LMNAMAPK1KMT2A
SCHEMBL915282 0.89 S1PR1 (0.46) GAANR1I2LMNAMAPK1KMT2A
SCHEMBL915696 0.88 PTPN1 (0.43) GAANR1I2LMNAMAPK1KMT2A
SCHEMBL916357 0.88 NR1I2 (0.43) GAANR1I2LMNAMAPK1KMT2A
SCHEMBL915136 0.85 GAA (0.62) GAANR1I2L3MBTL1LMNAMAPK1
SCHEMBL914605 0.84 NR1I2 (0.40) GAANR1I2LMNAMAPK1KMT2A
SCHEMBL915509 0.83 SMN1; SMN2 (0.46) GAANR1I2LMNAKMT2AALDH1A1
SCHEMBL915529 0.83 GAA (0.44) GAANR1I2L3MBTL1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed