SCHEMBL915654

SCHEMBL915654

CCOP(=O)(Cc1cc(C(=O)OC)cc(C(=O)OC)c1)OCC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.46
ALDH1A1 P00352 2/20 0.44
LMNA P02545 2/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42
CA14 Q9ULX7 1/20 0.42
MAPT P10636 3/20 0.41
HSD17B10 Q99714 1/20 0.41
POLB P06746 1/20 0.41
GAA P10253 1/20 0.41
NFKB1 P19838 1/20 0.41
XDH P47989 1/20 0.41
GFER P55789 1/20 0.41
NFKB2 Q00653 1/20 0.41
RELA Q04206 1/20 0.41
FUT7 Q11130 1/20 0.41
TDP1 Q9NUW8 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915746 0.87 KDM4E (0.46) KDM4EALDH1A1LMNACA12CA1
SCHEMBL5477407 0.87 CA12 (0.50) KDM4EALDH1A1LMNACA12CA1
SCHEMBL498351 0.85 LOXL2 (0.57) KDM4EALDH1A1MAPTLOXL2HTT
SCHEMBL73418 0.84 LOXL2 (0.53) KDM4EALDH1A1LMNACA12CA1
SCHEMBL28088497 0.84 ATM (0.49) KDM4EALDH1A1MAPTLOXL2HTT
SCHEMBL914194 0.83 MAPT (0.43) ALDH1A1MAPTNFKB1NFKB2RELA
SCHEMBL915111 0.80 LOXL2 (0.49) CA12CA1CA2CA7CA9
SCHEMBL915492 0.80 PGK1 (0.50) KDM4EALDH1A1LMNACA12CA1
SCHEMBL13913134 0.78 TSHR (0.50) MAPTPOLBTDP1HTT
SCHEMBL7590981 0.78 KDM4E (0.44) KDM4EALDH1A1LMNACA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
CN-101208371-B Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI 2011-08-10 CN disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101208371-A Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI (JP) 2008-06-25 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed