SCHEMBL916692

SCHEMBL916692

CCOP(=O)(Cc1cc(OCCOC)cc(OCCOC)c1)OCC

nearest known ligand 0.35

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.35
TSHR P16473 1/20 0.35
CCNT1 O60563 4/20 0.35
CDK9 P50750 4/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
MAPK1 P28482 1/20 0.35
CYP2C19 P33261 1/20 0.35
HTT P42858 1/20 0.35
PSEN1 P49768 1/20 0.34
PSEN2 P49810 1/20 0.34
APH1B Q8WW43 1/20 0.34
NCSTN Q92542 1/20 0.34
APH1A Q96BI3 1/20 0.34
PSENEN Q9NZ42 1/20 0.34
PKM P14618 1/20 0.33
KDM4E B2RXH2 2/20 0.33
RECQL P46063 1/20 0.33
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2070453 0.87 MAPT (0.35) MAPTTSHRCCNT1CDK9HTT
SCHEMBL915209 0.86 PPARD (0.37) CYP1A2CYP2D6MAPK1CYP2C19PKM
SCHEMBL916805 0.86 PPARD (0.42) MAPTTSHRCCNT1CDK9HTT
SCHEMBL915329 0.85 KDM4E (0.46) TSHRCCNT1CDK9CYP1A2CYP2D6
SCHEMBL915260 0.84 KDM4E (0.42) MAPTCCNT1CDK9PKMKDM4E
SCHEMBL1486664 0.83 ALDH1A1 (0.41) MAPTTSHRCCNT1CDK9MAPK1
SCHEMBL18389722 0.83 MAPT (0.35) MAPTTSHRCCNT1CDK9HTT
SCHEMBL914820 0.80 KDM4E (0.39) CCNT1CDK9CYP2D6PKMKDM4E
SCHEMBL4636042 0.80 LTA4H (0.39) MAPTCCNT1CDK9CYP1A2CYP2D6
SCHEMBL13913134 0.78 TSHR (0.50) MAPTTSHRCCNT1CDK9HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed