SCHEMBL915209

SCHEMBL915209

CCOP(=O)(O)Cc1cc(OCCOC)cc(OCCOC)c1

nearest known ligand 0.37

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PPARD Q03181 1/20 0.37
ALDH1A1 P00352 2/20 0.35
GGPS1 O95749 4/20 0.35
INPPL1 O15357 1/20 0.34
CYP2D6 P10635 3/20 0.34
MAPK1 P28482 2/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2C19 P33261 1/20 0.34
PLA2G2A P14555 1/20 0.33
KDM4E B2RXH2 1/20 0.33
GAA P10253 1/20 0.33
PKM P14618 1/20 0.33
PGK1 P00558 1/20 0.33
PGK2 P07205 1/20 0.33
LMNA P02545 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915542 0.88 PPARD (0.44) PPARDALDH1A1GGPS1PLA2G2APGK1
SCHEMBL916692 0.86 MAPT (0.35) ALDH1A1CYP2D6MAPK1CYP1A2CYP2C19
SCHEMBL916934 0.85 GGPS1 (0.48) ALDH1A1GGPS1CYP2D6MAPK1CYP1A2
SCHEMBL916688 0.84 ACACB (0.41) ALDH1A1CYP2D6CYP1A2CYP2C19KDM4E
SCHEMBL7046484 0.83 PPARD (0.41) PPARDALDH1A1KDM4EGAAPGK1
SCHEMBL915312 0.83 PGK1 (0.48) GGPS1INPPL1PGK1PGK2
SCHEMBL916693 0.81 GGPS1 (0.33) ALDH1A1GGPS1INPPL1PLA2G2AKDM4E
SCHEMBL914836 0.81 S1PR1 (0.43) PPARDKDM4E
SCHEMBL915355 0.81 LTA4H (0.41) PPARDCYP1A2CYP2C19KDM4E
SCHEMBL915717 0.81 PTPN1 (0.43) CYP2D6CYP1A2CYP2C19KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed