Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.94 |
| ▸ | IDO1 | P14902 | 1/20 | 0.55 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.52 |
| ▸ | TSHR | P16473 | 3/20 | 0.52 |
| ▸ | HPGD | P15428 | 3/20 | 0.52 |
| ▸ | MAPT | P10636 | 2/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.52 |
| ▸ | RECQL | P46063 | 2/20 | 0.52 |
| ▸ | APP | P05067 | 1/20 | 0.52 |
| ▸ | THRB | P10828 | 1/20 | 0.52 |
| ▸ | CASP1 | P29466 | 1/20 | 0.52 |
| ▸ | SNCA | P37840 | 1/20 | 0.52 |
| ▸ | NQO2 | P16083 | 1/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.52 |
| ▸ | PLAU | P00749 | 1/20 | 0.52 |
| ▸ | MAPKAPK2 | P49137 | 1/20 | 0.52 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1-Naphthol SCHEMBL8562499 | 1.00 | CYP1A2 (0.94) | CYP1A2IDO1PTPN22HSD17B10TDP1 | |
| 1-Naphthol SCHEMBL10486461 | 0.97 | CYP1A2 (1.00) | CYP1A2IDO1PTPN22HSD17B10TDP1 | |
| 1-Naphthol SCHEMBL273260 | 0.97 | CYP1A2 (1.00) | CYP1A2IDO1PTPN22HSD17B10TDP1 | |
| 1-Naphthol SCHEMBL3416 | 0.97 | CYP1A2 (1.00) | CYP1A2IDO1PTPN22HSD17B10TDP1 | |
| 1-Naphthol SCHEMBL29767730 | 0.97 | CYP1A2 (1.00) | CYP1A2IDO1PTPN22HSD17B10TDP1 | |
| 1-Naphthol SCHEMBL7608382 | 0.94 | CYP1A2 (0.94) | CYP1A2IDO1PTPN22HSD17B10TDP1 | |
| 1-Naphthol SCHEMBL11319254 | 0.94 | CYP1A2 (0.94) | CYP1A2IDO1PTPN22HSD17B10TDP1 | |
| 1-Naphthol SCHEMBL21490911 | 0.94 | CYP1A2 (0.94) | CYP1A2IDO1PTPN22HSD17B10TDP1 | |
| 1-Naphthol SCHEMBL9850314 | 0.94 | CYP1A2 (0.94) | CYP1A2IDO1PTPN22HSD17B10TDP1 | |
| 1-Naphthol SCHEMBL7207908 | 0.94 | CYP1A2 (0.94) | CYP1A2IDO1PTPN22HSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0508442-B1 | A deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition | SUMITOMO CHEMICAL CO (JP) | 1995-04-12 | — | — | EP | claimed |
| EP-0508442-A1 | A deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1992-10-14 | — | — | EP | claimed |
| JP-4311702-A | — | — | None | — | — | JP | disclosed |
| JP-4311702-A | — | — | None | — | — | JP | disclosed |
| JP-7173205-A | — | — | None | — | — | JP | disclosed |
| CN-108699395-A | Oligoester and combinations thereof | 科腾化学品有限责任公司 | 2018-10-23 | — | — | CN | disclosed |
| JP-H07173205-A | PRODUCTION OF STYRENIC POLYMER BEADS | SUMITOMO CHEM CO LTD | 1995-07-11 | — | — | JP | disclosed |
| EP-0508442-B1 | A deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition | SUMITOMO CHEMICAL CO (JP) | 1995-04-12 | — | — | EP | disclosed |
| US-5321104-A | Deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition | SUMITOMO CHEMICAL CO., LTD. (JP) | 1994-06-14 | — | — | US | disclosed |
| US-5321104-A | Deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition | SUMITOMO CHEMICAL CO., LTD. (JP) | 1994-06-14 | — | — | US | disclosed |
| JP-H04311702-A | ANTI-ADHESION AGENT FOR POLYMERIZER INNER SURFACE COMPRISING NAPHTHOL SULFIDE COMPOUND AND POLYMERIZATION OF VINYLIC MONOMER WITH THE AGENT | SUMITOMO CHEM CO LTD | 1992-11-04 | — | — | JP | disclosed |
| JP-H04311702-A | ANTI-ADHESION AGENT FOR POLYMERIZER INNER SURFACE COMPRISING NAPHTHOL SULFIDE COMPOUND AND POLYMERIZATION OF VINYLIC MONOMER WITH THE AGENT | SUMITOMO CHEM CO LTD | 1992-11-04 | — | — | JP | disclosed |
| EP-0508442-A1 | A deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1992-10-14 | — | — | EP | disclosed |
| EP-0508442-A1 | A deposit suppressant composition for the internal surfaces of a polymerization reactor and a method of polymerizing vinyl monomers with use of said deposit suppressant composition | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1992-10-14 | — | — | EP | disclosed |
| US-4684681-A | Flow enhanced polyphenylene ether resin compositions | GENERAL ELECTRIC COMPANY (US) | 1987-08-04 | — | — | US | disclosed |