1-Naphthol

1-Naphthol

SCHEMBL7207908

Oc1cccc2ccccc12.[KH]

nearest known ligand 0.94

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 2/20 0.94
▸ IDO1 P14902 1/20 0.55
▸ PTPN22 Q9Y2R2 1/20 0.54
▸ HSD17B10 Q99714 5/20 0.52
▸ TDP1 Q9NUW8 3/20 0.52
▸ TSHR P16473 3/20 0.52
▸ HPGD P15428 3/20 0.52
▸ MAPT P10636 2/20 0.52
▸ ALOX15 P16050 2/20 0.52
▸ RECQL P46063 2/20 0.52
▸ APP P05067 1/20 0.52
▸ THRB P10828 1/20 0.52
▸ CASP1 P29466 1/20 0.52
▸ SNCA P37840 1/20 0.52
▸ NQO2 P16083 1/20 0.52
▸ KDM4E B2RXH2 2/20 0.52
▸ PLAU P00749 1/20 0.52
▸ MAPKAPK2 P49137 1/20 0.52
▸ CTDSP1 Q9GZU7 1/20 0.52
▸ ALDH1A1 P00352 3/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1-Naphthol SCHEMBL29767730 0.97 CYP1A2 (1.00) CYP1A2IDO1PTPN22HSD17B10TDP1
1-Naphthol SCHEMBL273260 0.97 CYP1A2 (1.00) CYP1A2IDO1PTPN22HSD17B10TDP1
1-Naphthol SCHEMBL10486461 0.97 CYP1A2 (1.00) CYP1A2IDO1PTPN22HSD17B10TDP1
1-Naphthol SCHEMBL3416 0.97 CYP1A2 (1.00) CYP1A2IDO1PTPN22HSD17B10TDP1
1-Naphthol SCHEMBL11319254 0.94 CYP1A2 (0.94) CYP1A2IDO1PTPN22HSD17B10TDP1
1-Naphthol SCHEMBL21490911 0.94 CYP1A2 (0.94) CYP1A2IDO1PTPN22HSD17B10TDP1
1-Naphthol SCHEMBL4196679 0.94 CYP1A2 (0.94) CYP1A2IDO1PTPN22HSD17B10TDP1
1-Naphthol SCHEMBL8562500 0.94 CYP1A2 (0.94) CYP1A2IDO1PTPN22HSD17B10TDP1
1-Naphthol SCHEMBL9169707 0.94 CYP1A2 (0.94) CYP1A2IDO1PTPN22HSD17B10TDP1
1-Naphthol SCHEMBL7608382 0.94 CYP1A2 (0.94) CYP1A2IDO1PTPN22HSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1025327-C Process for production of aromatic hydroxycarboxylic acid VENO SEIYAKU OYO KENKYUJO KK (JP) 1994-07-06 — — CN claimed
CN-1034362-A The preparation method of aromatic hydroxycarboxylic acid UENO SEIYAKU OYO KENKYUJO KK (JP) 1989-08-02 — — CN claimed
CN-113811574-A Polyisocyanurate-based polymer and fiber-reinforced composite material 三聚体科技有限责任公司 2021-12-17 — — CN disclosed
CN-101831083-B Reactive flame retardant and flame-retardant resin processed article FUJI ELECTRIC CO LTD 2012-07-18 — — CN disclosed
CN-101831083-A Reactive flame retardant and flame-retardant resin processed article FUJI ELECTRIC HOLDINGS 2010-09-15 — — CN disclosed
CN-101124298-A Reactive flame retardant and flame-retardant resin processed article FUJI ELECTRIC HOLDINGS (JP) 2008-02-13 — — CN disclosed
CN-1515547-A Naphthol derivative ��ʽ������Ұ��ҩӦ���о��� 2004-07-28 — — CN disclosed
US-6649226-B2 Mixture containing dissociating materials; controlling static electricity NEC LCD TECHNOLOGIES, LTD. (JP) 2003-11-18 — — US disclosed
CN-1125144-C Azo compounds and process for preparing the same UENO SEIYAKU OYO KENKYUJO KK (JP) 2003-10-22 — — CN disclosed
US-20020028305-A1 Liquid crystal material and liquid crystal display GETNER FOUNDATION LLC 2002-03-07 — — US disclosed
CN-1291216-A Azo compounds and process for preparing the same UENO SEIYAKU OYO KENKYUJO KK (JP) 2001-04-11 — — CN disclosed
US-5965715-A Bisazo compounds and process for the preparation thereof KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1999-10-12 — — US disclosed
EP-0882767-A1 BISAZO COMPOUNDS AND PROCESS FOR THE PREPARATION THEREOF KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JP) 1998-12-09 — — EP disclosed
CN-1025327-C Process for production of aromatic hydroxycarboxylic acid VENO SEIYAKU OYO KENKYUJO KK (JP) 1994-07-06 — — CN disclosed
CN-1034362-A The preparation method of aromatic hydroxycarboxylic acid UENO SEIYAKU OYO KENKYUJO KK (JP) 1989-08-02 — — CN disclosed
EP-0081753-B1 PROCESS FOR SELECTIVE PRODUCTION OF 2-HYDROXYNAPHTHALENE-6-CARBOXYLIC ACID Kabushiki Kaisha Ueno Seiyaku Oyo Kenkyujo (JP) 1985-11-06 — — EP disclosed
EP-0066205-B1 PROCESS FOR PREPARATION OF 2-HYDROXYNAPHTHALENE-3-CARBOXYLIC ACID Kabushiki Kaisha Ueno Seiyaku Oyo Kenkyujo (JP) 1985-09-04 — — EP disclosed
US-4110375-A INTERMEDIATES HOECHST AKTIENGESELLSCHAFT (DE) 1978-08-29 — — US disclosed
US-4064349-A INTERMEDIATES HOECHST AKTIENGESELLSCHAFT (DT) 1977-12-20 — — US disclosed
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