SCHEMBL917065

SCHEMBL917065

CCOP(=O)(Cc1cc(OCCO)ccc1OCCO)OCC

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
INPPL1 O15357 1/20 0.39
NR1I2 O75469 1/20 0.38
EGFR P00533 2/20 0.38
KDM4E B2RXH2 1/20 0.37
GAA P10253 1/20 0.37
KMT2A Q03164 1/20 0.37
PPARG P37231 2/20 0.37
PTGES O14684 1/20 0.37
ALOX5 P09917 1/20 0.37
PPARD Q03181 2/20 0.37
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA9 Q16790 1/20 0.36
PSEN1 P49768 1/20 0.35
PSEN2 P49810 1/20 0.35
APH1B Q8WW43 1/20 0.35
NCSTN Q92542 1/20 0.35
APH1A Q96BI3 1/20 0.35
PSENEN Q9NZ42 1/20 0.35
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915784 0.89 INPPL1 (0.42) INPPL1NR1I2KDM4EGAAKMT2A
SCHEMBL916366 0.88 INPPL1 (0.40) INPPL1EGFRKDM4EPPARGPTGES
SCHEMBL916788 0.82 L3MBTL1 (0.47) EGFRKDM4EPPARDALDH1A1MAPT
SCHEMBL915314 0.81 INPPL1 (0.47) INPPL1NR1I2GAAPPARGPTGES
SCHEMBL917394 0.79 NR1I2 (0.46) NR1I2KDM4EGAAKMT2APPARD
SCHEMBL916024 0.78 INPPL1 (0.46) INPPL1KDM4EPPARGPTGESALOX5
SCHEMBL914765 0.77 IDO1 (0.49) EGFRPPARGPPARDPSEN1PSEN2
SCHEMBL915498 0.77 GGPS1 (0.45) KDM4EGAAALDH1A1L3MBTL1
SCHEMBL9164843 0.76 FDPS (0.43) GAAPSEN1PSEN2APH1BNCSTN
SCHEMBL915347 0.76 NR1I2 (0.44) NR1I2GAAKMT2APPARDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed