Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR2 | P34972 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 3/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.32 |
| ▸ | RAD52 | P43351 | 2/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.31 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.30 |
| ▸ | VDR | P11473 | 1/20 | 0.30 |
| ▸ | CASP2 | P42575 | 1/20 | 0.30 |
| ▸ | ALOX5AP | P20292 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL920198 | 0.88 | CYP2C9 (0.34) | CNR2MEN1KMT2AGAANCOA3 | |
| SCHEMBL919469 | 0.72 | ALDH1A1 (0.38) | MEN1KMT2AHTTEPHX2SMN1; SMN2 | |
| SCHEMBL920199 | 0.71 | BRD4 (0.33) | — | |
| SCHEMBL918694 | 0.69 | MEN1 (0.35) | MEN1KMT2AHTTSMN1; SMN2 | |
| SCHEMBL20540226 | 0.64 | PTPN1 (0.32) | GAASMN1; SMN2CHRNA7FFAR4 | |
| SCHEMBL20539857 | 0.64 | PDCD1 (0.38) | GAASMN1; SMN2CHRNA7 | |
| SCHEMBL9065006 | 0.62 | SMN1; SMN2 (0.50) | GAASMN1; SMN2 | |
| SCHEMBL16519363 | 0.62 | NQO1 (0.46) | HTT | |
| SCHEMBL32930869 | 0.62 | SMN1; SMN2 (0.47) | KMT2AGAASMN1; SMN2FFAR4 | |
| SCHEMBL1602489 | 0.60 | RAB9A (0.47) | HTTSMN1; SMN2CHRNA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7871755-B2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20090081582-A1 | irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation | KABUSHIKI KAISHA TOSHIBA | 2009-03-26 | — | — | US | disclosed |