Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 5/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.47 |
| ▸ | CASP3 | P42574 | 1/20 | 0.46 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.46 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.46 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | AR | P10275 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.42 |
| ▸ | HTR2B | P41595 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL8080600 | 0.98 | MEN1 (0.46) | MEN1KMT2ACASP3SENP8SENP7 | |
| Bromide SCHEMBL9172630 | 0.98 | MEN1 (0.46) | MEN1KMT2ACASP3SENP8SENP7 | |
| Hydrochloric Acid SCHEMBL11066823 | 0.97 | MEN1 (0.45) | MEN1KMT2ACASP3SENP8SENP7 | |
| SCHEMBL27805679 | 0.94 | MEN1 (0.43) | MEN1KMT2ACASP3SENP8SENP7 | |
| Sulfuric Acid SCHEMBL6357625 | 0.92 | MEN1 (0.47) | MEN1KMT2ACASP3SENP8SENP7 | |
| Sulfuric Acid SCHEMBL1123017 | 0.92 | PPARG (0.44) | MEN1KMT2ACASP3SENP8SENP7 | |
| Sulfuric Acid SCHEMBL6929881 | 0.90 | PPARG (0.43) | MEN1KMT2ACASP3SENP8SENP7 | |
| Phosphoric Acid SCHEMBL8777433 | 0.89 | MEN1 (0.48) | MEN1KMT2ACASP3SENP8SENP7 | |
| Sulfuric Acid SCHEMBL5698877 | 0.89 | MEN1 (0.45) | MEN1KMT2ACASP3SENP8SENP7 | |
| 2-Methoxyethanol SCHEMBL11874819 | 0.88 | MEN1 (0.44) | MEN1KMT2ACASP3SENP8SENP7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 415 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117247141-A | Quick-start directional embedded microbial film for MABR and application thereof | 中国科学院青岛生物能源与过程研究所 | 2023-12-19 | — | — | CN | claimed |
| US-7045269-B2 | Method for forming images using negative working imageable elements | EASTMAN KODAK COMPANY (US) | 2006-05-16 | — | — | US | claimed |
| US-6977131-B2 | Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements | KODAK POLYCHROME GRAPHICS LLC (US) | 2005-12-20 | — | — | US | claimed |
| US-20050277053-A1 | Increased sensitivity, IR, and UV imageable photographic elements | ANOCOIL CORPORATION | 2005-12-15 | — | — | US | claimed |
| US-20050277051-A1 | Increased sensitivity, UV imageable photographic elements | ANOCOIL CORPORATION | 2005-12-15 | — | — | US | claimed |
| CN-1659476-A | Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements | KODAK POLYCHOME GRAPHICS LLC (US) | 2005-08-24 | — | — | CN | claimed |
| WO-2005051663-A1 | METHOD FOR FORMING IMAGES USING NEGATIVE WORKING IMAGEABLE ELEMENTS | KODAK POLYCHROME GRAPHICS LLC (US) | 2005-06-09 | — | — | WO | claimed |
| EP-1508071-A1 | RADIATION-SENSITIVE COMPOSITIONS CONTAINING POLYMERIC SULFONATE ACID GENERATORS AND THEIR USE IN IMAGING | Kodak Polychrome Graphics LLC (US) | 2005-02-23 | — | — | EP | claimed |
| EP-1508072-A2 | ACID GENERATING AGENTS AND THEIR USE IN PROCESSES FOR IMAGING RADIATION-SENSITIVE ELEMENTS | Kodak Polychrome Graphics LLC (US) | 2005-02-23 | — | — | EP | claimed |
| US-20040180291-A1 | Method for forming images using negative working imageable elements | CITICORP NORTH AMERICA, INC., AS AGENT | 2004-09-16 | — | — | US | claimed |
| EP-0749045-B1 | Photosensitive compositions and their use in lithographic plates | KODAK POLYCHROME GRAPHICS LLC (US) | 2001-03-14 | — | — | EP | claimed |
| EP-0752430-B1 | Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates | KODAK POLYCHROME GRAPHICS LLC (US) | 2000-09-20 | — | — | EP | claimed |
| EP-0741334-B1 | Recording material which can be decoated with water, for the production of waterless offset printing plates | AGFA GEVAERT NV (BE) | 2000-09-20 | — | — | EP | claimed |
| EP-0757061-B1 | Sulfonamido substituted acetal polymers and use thereof in photosensitive compositions and lithographic printing plates | KODAK POLYCHROME GRAPHICS LLC (US) | 2000-09-13 | — | — | EP | claimed |
| US-5714300-A | Diazo based imaging element having improved storage stability | AGFA-GEVAERT, N.V. (BE) | 1998-02-03 | — | — | US | claimed |
| EP-0811878-A1 | A diazo based imaging element having increased sensitivity | AGFA-GEVAERT N.V. (BE) | 1997-12-10 | — | — | EP | claimed |
| EP-0737894-A2 | A diazo based imaging element having improved storage stability | AGFA-GEVAERT N.V. (BE) | 1996-10-16 | — | — | EP | claimed |
| EP-0074580-B1 | LIGHT-SENSITIVE POLYCONDENSATION PRODUCT COMPRISING DIAZONIUM GROUPS, AND LIGHT-SENSITIVE RECORDING MATERIAL MADE THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1986-12-03 | — | — | EP | claimed |
| EP-0096326-B1 | PHOTOSENSITIVE COMPOSITION DEVELOPABLE WITH WATER, AND PHOTOSENSITIVE COPYING MATERIAL PRODUCED THEREFROM | AMERICAN HOECHST CORPORATION (US) | 1986-07-30 | — | — | EP | claimed |
| US-4492748-A | Light-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewith | HOECHST AKTIENGESELLSCHAFT, A CORP. OF GERMANY (DE) | 1985-01-08 | — | — | US | claimed |