Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 5/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.46 |
| ▸ | CASP3 | P42574 | 1/20 | 0.44 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.44 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.44 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.44 |
| ▸ | FGFR2 | P21802 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | AR | P10275 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.41 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.41 |
| ▸ | HTR2B | P41595 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL11066823 | 0.98 | MEN1 (0.45) | MEN1KMT2ACASP3SENP8SENP7 | |
| SCHEMBL92096 | 0.98 | MEN1 (0.47) | MEN1KMT2ACASP3SENP8SENP7 | |
| Bromide SCHEMBL9172630 | 0.97 | MEN1 (0.46) | MEN1KMT2ACASP3SENP8SENP7 | |
| SCHEMBL27805679 | 0.93 | MEN1 (0.43) | MEN1KMT2ACASP3SENP8SENP7 | |
| Sulfuric Acid SCHEMBL6357625 | 0.90 | MEN1 (0.47) | MEN1KMT2ACASP3SENP8SENP7 | |
| Sulfuric Acid SCHEMBL1123017 | 0.90 | PPARG (0.44) | MEN1KMT2ACASP3SENP8SENP7 | |
| Sulfuric Acid SCHEMBL6929881 | 0.89 | PPARG (0.43) | MEN1KMT2ACASP3SENP8SENP7 | |
| Sulfuric Acid SCHEMBL5698877 | 0.88 | MEN1 (0.45) | MEN1KMT2ACASP3SENP8SENP7 | |
| Phosphoric Acid SCHEMBL8777433 | 0.88 | MEN1 (0.48) | MEN1KMT2ACASP3SENP8SENP7 | |
| 2-Methoxyethanol SCHEMBL11874819 | 0.87 | MEN1 (0.44) | MEN1KMT2ACASP3SENP8SENP7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5747790-A | Solid state imaging device and method of manufacturing same | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1998-05-05 | — | — | US | claimed |
| US-5404005-A | Solid state imaging device and method of manufacturing same | MATSUSHITA ELECTRONIC CORPORATION (JP) | 1995-04-04 | — | — | US | claimed |
| US-4248959-A | Preparation of diazo printing plates using laser exposure | AMERICAN HOECHST CORPORATION (US) | 1981-02-03 | — | — | US | claimed |
| EP-0741334-B1 | Recording material which can be decoated with water, for the production of waterless offset printing plates | AGFA GEVAERT NV (BE) | 2000-09-20 | — | — | EP | disclosed |
| US-5773187-A | LIGHT SENSITIVE ELEMENTS FOR OPTICAL RECORDING MATERIAL | AGFA-GEVAERT AG (DE) | 1998-06-30 | — | — | US | disclosed |
| US-5747790-A | Solid state imaging device and method of manufacturing same | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1998-05-05 | — | — | US | disclosed |
| EP-0741334-A1 | Recording material which can be decoated with water, for the production of waterless offset printing plates | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-11-06 | — | — | EP | disclosed |
| EP-0428362-B1 | Photosensitive resin and element made therefrom | HOECHST CELANESE CORP (US) | 1995-04-19 | — | — | EP | disclosed |
| US-5404005-A | Solid state imaging device and method of manufacturing same | MATSUSHITA ELECTRONIC CORPORATION (JP) | 1995-04-04 | — | — | US | disclosed |
| EP-0326714-B1 | Three dimensional light-sensitive diazonium condensates | HOECHST CELANESE CORP (US) | 1994-01-19 | — | — | EP | disclosed |
| EP-0279630-B1 | DEVELOPER FOR LIGHT-SENSITIVE LITHOGRAPHIC PRINTING PLATE CAPABLE OF PROCESSING COMMONLY THE NEGATIVE-TYPE AND THE POSITIVE TYPE AND DEVELOPER COMPOSITION FOR LIGHT-SENSITIVE MATERIAL | KONICA CORPORATION (JP) | 1993-10-13 | — | — | EP | disclosed |
| EP-0066990-A2 | Process for production of presensitized lithographic printing plates | KONICA CORPORATION (JP) | 1982-12-15 | — | — | EP | disclosed |
| EP-0061150-A1 | Light-sensitive polycondensation product, process for its preparation and light-sensitive recording material containing the same | AMERICAN HOECHST CORPORATION (US) | 1982-09-29 | — | — | EP | disclosed |
| US-4339530-A | Developer mixture for developing exposed light-sensistive copying layers | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-07-13 | — | — | US | disclosed |
| EP-0027932-A1 | Developer mixture and process for developing exposed copying layers sensitive to light | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-05-06 | — | — | EP | disclosed |
| US-4248959-A | Preparation of diazo printing plates using laser exposure | AMERICAN HOECHST CORPORATION (US) | 1981-02-03 | — | — | US | disclosed |
| US-4186017-A | Light-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-29 | — | — | US | disclosed |
| US-4153461-A | PRESENSITIZED ALUMINUM CONTAINING ANODIC ALUMINUM OXIDE REACTED WITH POLYVINYLPHOSPHONIC ACID | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-05-08 | — | — | US | disclosed |
| US-4035144-A | Dyeing preparations containing boric acid for preparing water-insoluble azo dyestuffs on fiber | HOECHST AKTIENGESELLSCHAFT (DT) | 1977-07-12 | — | — | US | disclosed |
| US-3957489-A | Solvent soluble diazonium metal salts and diazotype materials therefor | GAF CORPORATION (US) | 1976-05-18 | — | — | US | disclosed |