SCHEMBL921113

SCHEMBL921113

O=C(O)c1nc2[nH]c(=O)n(C(=O)O)c(=O)c2[nH]1

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.38
KDM4E B2RXH2 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2C9 P11712 1/20 0.34
PTPRB P23467 1/20 0.34
HSD17B10 Q99714 1/20 0.34
ADORA2B P29275 9/20 0.34
ADORA2A P29274 2/20 0.34
ADORA3 P0DMS8 5/20 0.34
ADORA1 P30542 1/20 0.34
PIN1 Q13526 1/20 0.31
FEN1 P39748 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1095773 0.74 ADORA2B (0.66) KDM4EHSD17B10ADORA2BADORA2AADORA3
SCHEMBL3085107 0.70 ADORA2B (0.58) KDM4EADORA2BADORA2AADORA3ADORA1
SCHEMBL3085104 0.68 LMNA (0.52) LMNAKDM4ECYP3A4CYP2C9PTPRB
SCHEMBL28473860 0.68 FEN1 (0.39) ADORA2BADORA2AADORA3ADORA1FEN1
SCHEMBL30894743 0.65 GDA (0.40) CYP2C9HSD17B10
SCHEMBL8952227 0.64 ADORA2B (0.32) ADORA2BADORA2AADORA3ADORA1
SCHEMBL27889745 0.60 JAK2 (0.38) LMNA
SCHEMBL28554737 0.59 KMT2A (0.40) KDM4EADORA2AADORA1
Acetic Acid SCHEMBL28746161 0.59 ADORA2B (0.52) LMNAKDM4ECYP3A4ADORA2BADORA2A
SCHEMBL14306615 0.58 LMNA (0.44) LMNAKDM4ECYP3A4CYP2C9PTPRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7875415-B2 photoacid generator, photoimageable polymer comprising self-assembly moiety and solubility switch, and comprising pi-stacked pyridine-containing quencher; polyesters INTEL CORPORATION (US) 2011-01-25 US disclosed
US-20070154836-A1 Helical pixilated photoresist INTEL CORPORATION 2007-07-05 US disclosed