SCHEMBL9213371

SCHEMBL9213371

Oc1ccc2nc(S)[nH]c2c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLAU P00749 1/20 0.61
PKM P14618 3/20 0.50
GAA P10253 2/20 0.50
CHEK1 O14757 1/20 0.50
PRKD3 O94806 1/20 0.50
PAK4 O96013 1/20 0.50
PDGFRA P16234 1/20 0.50
LTK P29376 1/20 0.50
MAP2K2 P36507 1/20 0.50
MAPK8 P45983 1/20 0.50
CDK8 P49336 1/20 0.50
RPS6KA3 P51812 1/20 0.50
PRKX P51817 1/20 0.50
NEK2 P51955 1/20 0.50
LIMK1 P53667 1/20 0.50
CDK5 Q00535 1/20 0.50
PRKCQ Q04759 1/20 0.50
MAP4K2 Q12851 1/20 0.50
ROCK1 Q13464 1/20 0.50
LRRK2 Q5S007 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7718077 0.84 PLAU (0.43) PLAUPKMGAACHEK1PRKD3
SCHEMBL29822916 0.79 ALDH1A1 (0.37) PLAUPKMGAAKDM4EPOLB
SCHEMBL28822617 0.79 ALDH1A1 (0.37) PLAUPKMGAAKDM4EPOLB
SCHEMBL28151598 0.79 PLAU (0.66) PLAUPKMGAACHEK1PRKD3
Methyl Alcohol SCHEMBL4797581 0.77 HSD17B10 (0.58) PKMGAACBFBKDM4EPOLB
SCHEMBL2106084 0.76 ALPL (0.56) CBFBAMY1A
SCHEMBL229608 0.76 KMT2A (0.58) PKMGAACBFBKDM4EPOLB
SCHEMBL172884 0.76 MEN1 (0.59) PKMGAAKDM4EPOLBGFER
SCHEMBL13893030 0.76 ALDH1A1 (0.35) PLAUGAAKDM4EPOLBGFER
SCHEMBL29770331 0.76 ALDH1A1 (0.61) TSHRCBFBAMY1AKDM4EGFER

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121282568-B Diaphragm and battery 珠海冠宇电池股份有限公司 2026-05-12 CN claimed
CN-121394778-B Diaphragm and battery 珠海冠宇电池股份有限公司 2026-05-12 CN claimed
CN-121238173-B Diaphragm and battery 珠海冠宇电池股份有限公司 2026-05-12 CN claimed
CN-116410733-A Composite material and preparation method thereof, photoelectric device and preparation method thereof, and display device TCL科技集团股份有限公司 2023-07-11 CN claimed
CN-121282568-B Diaphragm and battery 珠海冠宇电池股份有限公司 2026-05-12 CN disclosed
CN-121394778-B Diaphragm and battery 珠海冠宇电池股份有限公司 2026-05-12 CN disclosed
CN-121238173-B Diaphragm and battery 珠海冠宇电池股份有限公司 2026-05-12 CN disclosed
CN-121261064-B Battery cell 珠海冠宇电池股份有限公司 2026-05-12 CN disclosed
CN-116410733-A Composite material and preparation method thereof, photoelectric device and preparation method thereof, and display device TCL科技集团股份有限公司 2023-07-11 CN disclosed
US-11347146-B2 Resin composition TORAY INDUSTRIES, INC. (JP) 2022-05-31 US disclosed
US-11174350-B2 Resin and photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2021-11-16 US disclosed
US-20210116810-A1 RESIN COMPOSITION, RESIN SHEET, CURED FILM, METHOD FOR PRODUCING CURED FILM, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2021-04-22 US disclosed
US-20190081258-A1 RESIN AND PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 2019-03-14 US disclosed
US-20190004423-A1 CURED FILM AND METHOD FOR PRODUCING SAME TORAY INDUSTRIES, INC. (JP) 2019-01-03 US disclosed
US-20180066107-A1 PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 2018-03-08 US disclosed
EP-2899034-A1 ORIGINAL PLANOGRAPHIC PRINTING PLATE, AND PLATE MAKING METHOD FUJIFILM Corporation (JP) 2015-07-29 EP disclosed
US-20150192852-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD FUJIFILM CORPORATION (JP) 2015-07-09 US disclosed
CN-104619512-A Original planographic printing plate, and plate making method FUJIFILM CORP 2015-05-13 CN disclosed
WO-1995000478-A1 ARYLTRIFLATES AND RELATED COMPOUNDS LUNDBECK & CO AS H (DK) 1995-01-05 WO disclosed
US-4873346-A BRONCHODILATORS, TREATMENT OF ASTHMA THE UPJOHN COMPANY (US) 1989-10-10 US disclosed