SCHEMBL9221920

SCHEMBL9221920

CSc1ccccc1OCC(=O)O

nearest known ligand 0.61

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 4/20 0.61
SMN1; SMN2 Q16637 2/20 0.61
POLB P06746 2/20 0.61
GLA P06280 1/20 0.61
PTGDR2 Q9Y5Y4 6/20 0.53
KDM4E B2RXH2 3/20 0.53
HPGD P15428 3/20 0.53
TDP1 Q9NUW8 2/20 0.53
ALDH1A1 P00352 2/20 0.53
MAPT P10636 2/20 0.52
ALOX15 P16050 1/20 0.50
HTT P42858 1/20 0.44
SLC6A9 P48067 1/20 0.43
CASP1 P29466 1/20 0.43
HSD17B10 Q99714 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9346863 0.85 L3MBTL1 (0.59) L3MBTL1SMN1; SMN2POLBGLAPTGDR2
SCHEMBL20738265 0.84 KDM4E (0.56) L3MBTL1SMN1; SMN2POLBGLAKDM4E
SCHEMBL8638051 0.82 L3MBTL1 (0.56) L3MBTL1SMN1; SMN2POLBGLAPTGDR2
SCHEMBL340762 0.80 L3MBTL1 (0.80) L3MBTL1SMN1; SMN2POLBGLAPTGDR2
SCHEMBL29682135 0.80 L3MBTL1 (0.80) L3MBTL1SMN1; SMN2POLBGLAPTGDR2
SCHEMBL19957705 0.80 USP2 (0.56) L3MBTL1SMN1; SMN2POLBGLAKDM4E
SCHEMBL4613990 0.80 LMNA (0.51) ALDH1A1SLC6A9
SCHEMBL2059516 0.80 KMT2A (0.55) L3MBTL1SMN1; SMN2POLBGLAKDM4E
SCHEMBL31607061 0.79 TSHR (0.61) L3MBTL1SMN1; SMN2GLAKDM4EHPGD
Ammonia Solution, Strong SCHEMBL28240461 0.78 L3MBTL1 (0.77) L3MBTL1SMN1; SMN2POLBGLAPTGDR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4946761-A POLYMER CONTAINING CARBOXYL END GROUPS FUJI PHOTO FILM CO., LTD. (JP) 1990-08-07 US claimed
CN-100468104-C Method for manufacturing photonic crystal 3M INNOVATIVE PROPERTIES CO (US) 2009-03-11 CN disclosed
CN-100392444-C Method of manufacturing photonic crystals and controllable defects therein 3M INNOVATIVE PROPERTIES CO (US) 2008-06-04 CN disclosed
CN-101006373-A Process for producing photonic crystals 3M INNOVATIVE PROPERTIES CO (US) 2007-07-25 CN disclosed
US-7186500-B2 Silver halide photographic lightsensitive material FUJI PHOTO FILM CO., LTD. (JP) 2007-03-06 US disclosed
US-7186500-B2 Silver halide photographic lightsensitive material FUJI PHOTO FILM CO., LTD. (JP) 2007-03-06 US disclosed
CN-1894611-A Method for producing photon crystal and controllable defect therein 3M INNOVATIVE PROPERTIES CO (US) 2007-01-10 CN disclosed
US-5395733-A Unsaturated polymer layer that can be decarboxylated on exposure to light and sensitizers FUJI PHOTO FILM CO., LTD. (JP) 1995-03-07 US disclosed
US-4946761-A POLYMER CONTAINING CARBOXYL END GROUPS FUJI PHOTO FILM CO., LTD. (JP) 1990-08-07 US disclosed
EP-0350163-A2 Renin inhibitory peptides BEECHAM GROUP PLC (GB) 1990-01-10 EP disclosed
US-4405705-A HYDROPHILIC TOYO BOSEKI KABUSHIKI KAISHA T/A TOYOBA CO., LTD. (JP) 1983-09-20 US disclosed