SCHEMBL9233111

SCHEMBL9233111

[SiH3]CCCCCCCC[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6447689 1.00
SCHEMBL14645640 1.00
SCHEMBL16154019 1.00
SCHEMBL2567991 1.00
SCHEMBL16793282 1.00
SCHEMBL3804333 0.94
SCHEMBL707236 0.94
SCHEMBL400341 0.80
SCHEMBL25173757 0.78 TSHR (0.44)
SCHEMBL15965319 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4106913-A1 COMPOSITIONS, METHODS AND SYSTEMS FOR SAMPLE PROCESSING 10X Genomics, Inc. (US) 2022-12-28 EP disclosed
US-20220016624-A1 COMPOSITIONS, METHODS AND SYSTEMS FOR SAMPLE PROCESSING 10X GENOMICS, INC. 2022-01-20 US disclosed
US-9343293-B2 Flowable silicon—carbon—oxygen layers for semiconductor processing APPLIED MATERIALS, INC. (US) 2016-05-17 US disclosed
CN-103443133-B Block copolymers from silylated vinyl-terminated macromonomers EXXONMOBIL CHEM PATENTS INC 2015-01-07 CN disclosed
US-20140302688-A1 FLOWABLE SILICON-CARBON-OXYGEN LAYERS FOR SEMICONDUCTOR PROCESSING APPLIED MATERIALS, INC. (US) 2014-10-09 US disclosed
US-8835563-B2 Block copolymers from silylated vinyl terminated macromers EXXONMOBIL CHEMICAL PATENTS INC. (US) 2014-09-16 US disclosed
US-8753985-B2 Molecular layer deposition of silicon carbide APPLIED MATERIALS, INC. (US) 2014-06-17 US disclosed
EP-2688919-A2 BLOCK COPOLYMERS FROM SILYLATED VINYL TERMINATED MACROMERS Exxon-Mobil Chemical Patents Inc. (US) 2014-01-29 EP disclosed
US-20130267079-A1 MOLECULAR LAYER DEPOSITION OF SILICON CARBIDE APPLIED MATERIALS, INC. (US) 2013-10-10 US disclosed
US-20130217241-A1 TREATMENTS FOR DECREASING ETCH RATES AFTER FLOWABLE DEPOSITION OF SILICON-CARBON-AND-NITROGEN-CONTAINING LAYERS APPLIED MATERIALS, INC. (US) 2013-08-22 US disclosed
US-20130217240-A1 FLOWABLE SILICON-CARBON-NITROGEN LAYERS FOR SEMICONDUCTOR PROCESSING APPLIED MATERIALS, INC. (US) 2013-08-22 US disclosed
US-20130217240-A1 FLOWABLE SILICON-CARBON-NITROGEN LAYERS FOR SEMICONDUCTOR PROCESSING APPLIED MATERIALS, INC. (US) 2013-08-22 US disclosed
US-20130217239-A1 FLOWABLE SILICON-AND-CARBON-CONTAINING LAYERS FOR SEMICONDUCTOR PROCESSING APPLIED MATERIALS, INC. (US) 2013-08-22 US disclosed
US-20130217241-A1 TREATMENTS FOR DECREASING ETCH RATES AFTER FLOWABLE DEPOSITION OF SILICON-CARBON-AND-NITROGEN-CONTAINING LAYERS APPLIED MATERIALS, INC. (US) 2013-08-22 US disclosed
US-20130217243-A1 DOPING OF DIELECTRIC LAYERS APPLIED MATERIALS, INC. (US) 2013-08-22 US disclosed
WO-2013085684-A1 DOPING OF DIELECTRIC LAYERS APPLIED MATERIALS, INC. (US) 2013-06-13 WO disclosed
WO-2013062756-A1 TREATMENTS FOR DECREASING ETCH RATES AFTER FLOWABLE DEPOSITION OF SILICON-CARBON-AND-NITROGEN-CONTAINING LAYERS APPLIED MATERIALS, INC. (US) 2013-05-02 WO disclosed
WO-2012134716-A2 BLOCK COPOLYMERS FROM SILYLATED VINYL TERMINATED MACROMERS EXXONMOBIL CHEMICAL PATENTS INC., A CORPORATION OF THE STATE OF DELEWARE (US) 2012-10-04 WO disclosed
US-20120245293-A1 Block Copolymers from Silylated Vinyl Terminated Macromers EXXONMOBIL CHEMICAL PATENTS INC. 2012-09-27 US disclosed
US-5527934-A HYDROSILATING BIS(DICHLOROSILYL)METHANES WITH ORGANOOLEFINS OR ORGANOSILYLOLEFINS IN THE PRESENCE OF CHLOROPLATINIC ACID CATALYST KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 1996-06-18 US disclosed