SCHEMBL4019967

SCHEMBL4019967

C1=Cc2cccc3cccc1c23.C=Cc1cccc2c(O)cccc12

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.40
POLB P06746 3/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
APP P05067 1/20 0.36
MAPT P10636 1/20 0.36
THRB P10828 1/20 0.36
HPGD P15428 1/20 0.36
ALOX15 P16050 1/20 0.36
TSHR P16473 1/20 0.36
CASP1 P29466 1/20 0.36
SNCA P37840 1/20 0.36
RECQL P46063 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ESR2 Q92731 1/20 0.35
CRHBP P24387 1/20 0.34
CRHR2 Q13324 1/20 0.34
MEN1 O00255 4/20 0.33
KMT2A Q03164 4/20 0.33
RAB9A P51151 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL546354 0.85 TRIM24 (0.38) CYP1A2POLBL3MBTL1MAPTHPGD
SCHEMBL92353 0.83 IDO1 (0.46) CYP1A2POLBL3MBTL1APPMAPT
SCHEMBL4201879 0.82 CYP1A2 (0.42) CYP1A2POLBL3MBTL1APPMAPT
SCHEMBL4017834 0.82 CYP1A2 (0.57) CYP1A2POLBL3MBTL1CRHBPCRHR2
Styrene SCHEMBL15048584 0.79 ALDH1A1 (0.41) POLBL3MBTL1MAPTHPGDTSHR
SCHEMBL15048556 0.76 RRM1 (0.36) POLBL3MBTL1MAPTTHRBHPGD
SCHEMBL16895027 0.75 MAPT (0.36) MAPTHPGDHSD17B10MEN1KMT2A
SCHEMBL924802 0.74 HSD17B10 (0.50) CYP1A2POLBAPPMAPTTHRB
SCHEMBL1506766 0.74 ALDH1A1 (0.45) CYP1A2POLBL3MBTL1APPMAPT
SCHEMBL4199563 0.73 GRIN2D (0.44) CYP1A2POLBL3MBTL1MAPTESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7510820-B2 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-31 US disclosed
US-20070122740-A1 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-31 US disclosed