Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL824291 | 0.91 | HSD11B1 (0.33) | ALDH1A1EPHX2HSD11B1 | |
| SCHEMBL11948913 | 0.85 | HSD11B1 (0.37) | ALDH1A1EPHX2HSD11B1 | |
| SCHEMBL10259440 | 0.82 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL13849147 | 0.78 | L3MBTL1 (0.36) | ALDH1A1EPHX2HSD11B1 | |
| SCHEMBL9244764 | 0.77 | EPHX2 (0.31) | EPHX2HSD11B1 | |
| SCHEMBL12198847 | 0.77 | HSD11B1 (0.41) | ALDH1A1EPHX2HSD11B1 | |
| SCHEMBL15279648 | 0.77 | HSD11B1 (0.35) | EPHX2HSD11B1 | |
| SCHEMBL13222978 | 0.76 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL10259092 | 0.76 | CYP17A1 (0.31) | — | |
| SCHEMBL21413068 | 0.75 | L3MBTL1 (0.45) | ALDH1A1EPHX2HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2482131-B1 | Resist composition and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2016-06-22 | — | — | EP | disclosed |
| US-8748076-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-10 | — | — | US | disclosed |
| US-8703384-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-22 | — | — | US | disclosed |
| US-20130101936-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-25 | — | — | US | disclosed |
| US-20120196228-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-02 | — | — | US | disclosed |
| US-20120164577-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120135350-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120135357-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |