Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21413068 | 0.86 | L3MBTL1 (0.45) | L3MBTL1HSD11B1EPHX2ALDH1A1 | |
| SCHEMBL2739903 | 0.83 | HSD11B1 (0.36) | L3MBTL1HSD11B1EPHX2ALDH1A1EPHX1 | |
| SCHEMBL10305878 | 0.81 | HSD11B1 (0.35) | HSD11B1EPHX2ALDH1A1MAPK1EPHX1 | |
| SCHEMBL23332998 | 0.80 | HSD11B1 (0.34) | L3MBTL1HSD11B1EPHX2EPHX1 | |
| SCHEMBL15279648 | 0.80 | HSD11B1 (0.35) | L3MBTL1HSD11B1EPHX2EPHX1 | |
| SCHEMBL16487733 | 0.80 | FKBP1A (0.36) | L3MBTL1HSD11B1EPHX2EPHX1 | |
| SCHEMBL15216856 | 0.80 | EPHX1 (0.36) | L3MBTL1HSD11B1EPHX2ALDH1A1EPHX1 | |
| SCHEMBL47501 | 0.80 | HSD11B1 (0.33) | L3MBTL1HSD11B1EPHX2ALDH1A1MAPK1 | |
| SCHEMBL824291 | 0.80 | HSD11B1 (0.33) | L3MBTL1HSD11B1EPHX2ALDH1A1MAPK1 | |
| SCHEMBL12755572 | 0.80 | HSD11B1 (0.33) | L3MBTL1HSD11B1EPHX2ALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2060600-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-20 | — | — | EP | disclosed |