SCHEMBL9245161

SCHEMBL9245161

O=C(CC=Cc1c(O)cc(O)cc1O)CC=Cc1c(O)cc(O)cc1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FASN P49327 1/20 0.39
▸ MEN1 O00255 3/20 0.36
▸ CYP3A4 P08684 3/20 0.36
▸ KMT2A Q03164 3/20 0.36
▸ PTGS1 P23219 1/20 0.36
▸ DRD3 P35462 1/20 0.36
▸ HPGD P15428 1/20 0.35
▸ TTR P02766 1/20 0.34
▸ MAPT P10636 1/20 0.34
▸ CHRNA7 P36544 1/20 0.34
▸ CA12 O43570 1/20 0.33
▸ CA1 P00915 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ CA7 P43166 1/20 0.33
▸ CA9 Q16790 1/20 0.33
▸ CA14 Q9ULX7 1/20 0.33
▸ SLC5A1 P13866 1/20 0.33
▸ SLC5A2 P31639 1/20 0.33
▸ NR1H2 P55055 1/20 0.33
▸ NR1H3 Q13133 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9248979 0.77 LCK (0.54) MEN1CYP3A4KMT2APTGS1HPGD
SCHEMBL9251329 0.75 CHRNA7 (0.53) MEN1KMT2APTGS1TTRCHRNA7
SCHEMBL9744284 0.74 CYP3A4 (0.39) MEN1CYP3A4KMT2APTGS1DRD3
SCHEMBL9744278 0.74 CYP3A4 (0.39) MEN1CYP3A4KMT2APTGS1DRD3
SCHEMBL1822107 0.74 TTR (0.52) FASNMEN1CYP3A4KMT2APTGS1
SCHEMBL1822108 0.74 TTR (0.52) FASNMEN1CYP3A4KMT2APTGS1
SCHEMBL9251206 0.71 CYP3A4 (0.42) MEN1CYP3A4KMT2AHPGDMAPT
SCHEMBL9251733 0.71 BACE1 (0.53) MEN1KMT2AHPGDMAPT
SCHEMBL514047 0.70 CA1 (0.48) MEN1CYP3A4KMT2APTGS1HPGD
SCHEMBL514048 0.70 CA1 (0.48) MEN1CYP3A4KMT2APTGS1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0369219-B1 Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material HOECHST AG (DE) 1995-01-04 — — EP disclosed
EP-0244763-B1 POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE RECORDING MATERIAL PREPARED THEREFROM HOECHST CELANESE CORPORATION (US) 1993-03-10 — — EP disclosed
EP-0244762-B1 PHOTOSENSITIVE POSITIVE COMPOSITION AND PHOTOSENSITIVE REGISTRATION MATERIAL PREPARED THEREFROM HOECHST CELANESE CORPORATION (US) 1992-01-15 — — EP disclosed
EP-0243964-B1 PHOTOSENSITIVE POSITIVE COMPOSITION AND PHOTOSENSITIVE REGISTRATION MATERIAL PREPARED THEREFROM HOECHST CELANESE CORPORATION (US) 1992-01-02 — — EP disclosed
EP-0369219-A1 Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material HOECHST AKTIENGESELLSCHAFT (DE) 1990-05-23 — — EP disclosed
EP-0244763-A2 Positive-working photosensitive composition and photosensitive recording material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 — — EP disclosed
EP-0244762-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 — — EP disclosed
EP-0243964-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-04 — — EP disclosed
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