SCHEMBL9251206

SCHEMBL9251206

O=C(CC=Cc1cc(O)c(O)c(O)c1)CC=Cc1cc(O)c(O)c(O)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP3A4 P08684 2/20 0.42
▸ PTGS2 P35354 1/20 0.41
▸ PAM P19021 1/20 0.39
▸ ALOX5 P09917 1/20 0.39
▸ ALDH1A1 P00352 3/20 0.38
▸ RECQL P46063 2/20 0.38
▸ KDM4E B2RXH2 3/20 0.37
▸ MAPT P10636 3/20 0.37
▸ TDP1 Q9NUW8 3/20 0.37
▸ POLB P06746 2/20 0.37
▸ GAA P10253 2/20 0.37
▸ APEX1 P27695 2/20 0.37
▸ BLM P54132 2/20 0.37
▸ MEN1 O00255 1/20 0.37
▸ KMT2A Q03164 1/20 0.37
▸ LMNA P02545 2/20 0.37
▸ CA12 O43570 1/20 0.37
▸ CA1 P00915 1/20 0.37
▸ CA2 P00918 1/20 0.37
▸ TP53 P04637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28301316 0.86 PAM (0.57) CYP3A4PTGS2PAMALOX5ALDH1A1
SCHEMBL9248979 0.81 LCK (0.54) CYP3A4PTGS2PAMALOX5ALDH1A1
SCHEMBL9246897 0.80 ALDH1A1 (0.63) CYP3A4PTGS2ALOX5ALDH1A1RECQL
SCHEMBL28302207 0.80 CYP4F2 (0.53) CYP3A4ALOX5KDM4ETDP1POLB
SCHEMBL4631529 0.76 CYP3A4 (0.63) CYP3A4PTGS2ALOX5ALDH1A1RECQL
SCHEMBL4631536 0.76 CYP3A4 (0.63) CYP3A4PTGS2ALOX5ALDH1A1RECQL
SCHEMBL9743228 0.74 CYP3A4 (0.45) CYP3A4PTGS2ALOX5ALDH1A1RECQL
SCHEMBL9743233 0.74 CYP3A4 (0.45) CYP3A4PTGS2ALOX5ALDH1A1RECQL
SCHEMBL4608757 0.74 PTGS2 (0.54) CYP3A4PTGS2ALOX5ALDH1A1KDM4E
SCHEMBL4608754 0.74 PTGS2 (0.54) CYP3A4PTGS2ALOX5ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0369219-B1 Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material HOECHST AG (DE) 1995-01-04 — — EP disclosed
EP-0244763-B1 POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE RECORDING MATERIAL PREPARED THEREFROM HOECHST CELANESE CORPORATION (US) 1993-03-10 — — EP disclosed
EP-0244762-B1 PHOTOSENSITIVE POSITIVE COMPOSITION AND PHOTOSENSITIVE REGISTRATION MATERIAL PREPARED THEREFROM HOECHST CELANESE CORPORATION (US) 1992-01-15 — — EP disclosed
EP-0243964-B1 PHOTOSENSITIVE POSITIVE COMPOSITION AND PHOTOSENSITIVE REGISTRATION MATERIAL PREPARED THEREFROM HOECHST CELANESE CORPORATION (US) 1992-01-02 — — EP disclosed
EP-0369219-A1 Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material HOECHST AKTIENGESELLSCHAFT (DE) 1990-05-23 — — EP disclosed
EP-0264845-A2 Multilayer positive-registration material HOECHST CELANESE CORPORATION (US) 1988-04-27 — — EP disclosed
EP-0244762-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 — — EP disclosed
EP-0244763-A2 Positive-working photosensitive composition and photosensitive recording material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-11 — — EP disclosed
EP-0243964-A2 Photosensitive positive composition and photosensitive registration material prepared therefrom HOECHST CELANESE CORPORATION (US) 1987-11-04 — — EP disclosed
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