Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX5 | P09917 | 3/20 | 0.62 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.57 |
| ▸ | HPGD | P15428 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.50 |
| ▸ | ESR1 | P03372 | 2/20 | 0.48 |
| ▸ | CDK5 | Q00535 | 1/20 | 0.48 |
| ▸ | CDK5R1 | Q15078 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | AURKA | O14965 | 1/20 | 0.46 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.46 |
| ▸ | P4HB | P07237 | 1/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
| ▸ | CA12 | O43570 | 1/20 | 0.45 |
| ▸ | GMNN | O75496 | 1/20 | 0.45 |
| ▸ | EGFR | P00533 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14850418 | 0.92 | ALOX5 (0.65) | ALOX5ESR2ESR1CDK5CDK5R1 | |
| SCHEMBL5002666 | 0.89 | ALOX5 (0.83) | ALOX5ESR2HPGDALDH1A1HSD17B10 | |
| SCHEMBL4636219 | 0.87 | ESR2 (0.55) | ALOX5ESR2HPGDALDH1A1HSD17B10 | |
| Hydroquinone SCHEMBL10580535 | 0.86 | ALDH1A1 (0.57) | ALOX5ESR2HPGDALDH1A1HSD17B10 | |
| SCHEMBL278749 | 0.86 | ALOX5 (0.62) | ALOX5ESR2HPGDALDH1A1HSD17B10 | |
| SCHEMBL29623114 | 0.86 | ALOX5 (0.62) | ALOX5ESR2HPGDALDH1A1HSD17B10 | |
| SCHEMBL18913903 | 0.84 | SMN1; SMN2 (0.57) | ALOX5ESR2HPGDALDH1A1HSD17B10 | |
| Resorcinol SCHEMBL10890031 | 0.84 | ALDH1A1 (0.63) | ALOX5ESR2HPGDALDH1A1HSD17B10 | |
| SCHEMBL30442890 | 0.83 | ALDH1A1 (0.67) | ESR2HPGDALDH1A1HSD17B10BCL2L1 | |
| SCHEMBL29623192 | 0.83 | ALDH1A1 (0.67) | ESR2HPGDALDH1A1HSD17B10BCL2L1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025053099-A1 | RESIN COMPOSITION, CURED PRODUCT, AND DISPLAY DEVICE | 東レ株式会社 | 2025-03-13 | — | — | WO | disclosed |
| EP-2323612-B1 | SERIES OF SKIN-WHITENING (LIGHTENING) COMPOUNDS | UNIGEN INC (US) | 2019-07-10 | — | — | EP | disclosed |
| EP-3070093-B1 | NOVEL ORGANOPHOSPHORUS COMPOUNDS BASED ON ANTHRACENTRIOL | EVONIK DEGUSSA GMBH (DE) | 2018-02-07 | — | — | EP | disclosed |
| EP-0488686-B1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORP (US) | 1995-09-27 | — | — | EP | disclosed |
| EP-0369219-B1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AG (DE) | 1995-01-04 | — | — | EP | disclosed |
| US-5300396-A | Process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORPORATION (US) | 1994-04-05 | — | — | US | disclosed |
| US-5256522-A | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing | HOECHST CELANESE CORPORATION (US) | 1993-10-26 | — | — | US | disclosed |
| EP-0244763-B1 | POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE RECORDING MATERIAL PREPARED THEREFROM | HOECHST CELANESE CORPORATION (US) | 1993-03-10 | — | — | EP | disclosed |
| US-5162510-A | Prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-4-sulfonic acid halide and an organic acid halide | HOECHST CELANESE CORPORATION (US) | 1992-11-10 | — | — | US | disclosed |
| EP-0488686-A1 | A process of making naphthoquinone diazide esters using lactone solvents | HOECHST CELANESE CORPORATION (US) | 1992-06-03 | — | — | EP | disclosed |
| EP-0369219-A1 | Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-05-23 | — | — | EP | disclosed |
| US-4902785-A | Phenolic photosensitizers containing quinone diazide and acidic halide substituents | HOECHST CELANESE CORPORATION (US) | 1990-02-20 | — | — | US | disclosed |
| US-4892801-A | PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1990-01-09 | — | — | US | disclosed |
| US-4863827-A | O-QUINONE DIAZIDE | AMERICAN HOECHST CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| EP-0264845-A2 | Multilayer positive-registration material | HOECHST CELANESE CORPORATION (US) | 1988-04-27 | — | — | EP | disclosed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | disclosed |
| EP-0244762-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0244763-A2 | Positive-working photosensitive composition and photosensitive recording material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0243964-A2 | Photosensitive positive composition and photosensitive registration material prepared therefrom | HOECHST CELANESE CORPORATION (US) | 1987-11-04 | — | — | EP | disclosed |