Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR4 | Q5NUL3 | 2/20 | 0.43 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.43 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | KIF11 | P52732 | 1/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.41 |
| ▸ | BCHE | P06276 | 1/20 | 0.39 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.39 |
| ▸ | MMP9 | P14780 | 1/20 | 0.39 |
| ▸ | MMP14 | P50281 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2057491 | 0.79 | KMT2A (0.57) | TDP1L3MBTL1SMN1; SMN2LMNAHTT | |
| SCHEMBL2057733 | 0.78 | TDP1 (0.58) | TDP1L3MBTL1SMN1; SMN2LMNAHTT | |
| SCHEMBL2233889 | 0.78 | BCHE (0.57) | FFAR4SMN1; SMN2LMNAHTTBCHE | |
| SCHEMBL27619654 | 0.77 | TDP1 (0.61) | TDP1SMN1; SMN2HTTMEN1KMT2A | |
| SCHEMBL29047652 | 0.74 | ALDH1A1 (0.66) | SMN1; SMN2LMNAHTTMMP2MMP9 | |
| SCHEMBL13290857 | 0.73 | FFAR4 (0.50) | FFAR4SLC6A4SLC6A3SMN1; SMN2KIF11 | |
| SCHEMBL6935707 | 0.73 | ALDH1A1 (0.49) | FFAR4TDP1L3MBTL1SMN1; SMN2LMNA | |
| SCHEMBL514383 | 0.72 | PTGS2 (0.65) | FFAR4SLC6A4SLC6A3SMN1; SMN2KIF11 | |
| SCHEMBL3688422 | 0.71 | CA1 (0.44) | — | |
| SCHEMBL11887272 | 0.70 | FFAR4 (0.48) | FFAR4SLC6A4SLC6A3SMN1; SMN2KIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8609013-B2 | Method of fabricating a microfabricated structure | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-12-17 | — | — | US | disclosed |
| EP-1942375-B1 | Inkjet printer head comprising photosensitive polymer complex containing silver nanoparticles and method of preparing the photosensitive polymer complex | SAMSUNG ELECTRONICS CO LTD (KR) | 2013-02-27 | — | — | EP | disclosed |
| US-8383317-B2 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; modifying surfaces of carbon nanotubes with polymerizable functional groups such as oxirane and anhydride groups; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-02-26 | — | — | US | disclosed |
| US-8211957-B2 | Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-07-03 | — | — | US | disclosed |
| US-7923110-B2 | Metal nanoparticle having a self-assembled monolayer on its surface, and formation of conductive pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-04-12 | — | — | US | disclosed |
| US-7875416-B2 | Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-01-25 | — | — | US | disclosed |
| US-20100323298-A1 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | PARK JONG JIN | 2010-12-23 | — | — | US | disclosed |
| US-7803514-B2 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-09-28 | — | — | US | disclosed |
| US-20100159219-A1 | Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes | PARK JONG JIN | 2010-06-24 | — | — | US | disclosed |
| US-20090206520-A1 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | SAMSUNG ELECTRONICS CO., LTD. | 2009-08-20 | — | — | US | disclosed |
| EP-1542241-B1 | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-09-27 | — | — | EP | disclosed |
| US-20050127355-A1 | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-06-16 | — | — | US | disclosed |
| EP-1542241-A1 | Composition for forming organic insulating film and organic insulating film formed from the same | Samsung Electronics Co., Ltd (KR) | 2005-06-15 | — | — | EP | disclosed |
| US-20040265755-A1 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-30 | — | — | US | disclosed |
| EP-1457821-A1 | Method of making carbon nanotube patterned film or carbon nanotube composite material using a composition comprising carbon nanotubes surface-modified with polymerizable moieties | Samsung Electronics Co., Ltd. (KR) | 2004-09-15 | — | — | EP | disclosed |
| US-20020015906-A1 | Polymer for photoresist, method of production thereof and photoresist composition containing polymer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-02-07 | — | — | US | disclosed |
| EP-0704762-B1 | Resist material and pattern formation | WAKO PURE CHEM IND LTD (JP) | 1999-12-15 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100159219-A1 | Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes | ACTN4, NCDN, PNN | FFAR4 3858/4885SLC6A4 1469/4885SLC6A3 1631/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.