SCHEMBL9292006

SCHEMBL9292006

O=C(O)C(=O)CC(=O)C(F)(F)C(F)(F)F

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 3/20 0.38
ERCC5 P28715 3/20 0.35
FEN1 P39748 3/20 0.35
OR51E2 Q9H255 2/20 0.33
LIPA P38571 1/20 0.33
THRB P10828 1/20 0.32
MAPK1 P28482 1/20 0.31
SLC13A3 Q8WWT9 1/20 0.31
EGLN1 Q9GZT9 1/20 0.31
TET2 Q6N021 1/20 0.30
HAO1 Q9UJM8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9170819 0.84 THRB (0.48) PTPN1ERCC5FEN1THRB
SCHEMBL7640644 0.81 LIPA (0.39) LIPATHRB
SCHEMBL2545088 0.79 PTPN1 (0.41) PTPN1ERCC5FEN1OR51E2
SCHEMBL4323475 0.77 PTPN1 (0.39) PTPN1ERCC5FEN1OR51E2
SCHEMBL28340474 0.77 PTPN1 (0.39) PTPN1ERCC5FEN1OR51E2
SCHEMBL1120004 0.75 LIPA (0.41) LIPA
SCHEMBL14946420 0.75 TET2 (0.34) LIPAEGLN1TET2
SCHEMBL2891773 0.74 PLOD2 (0.39) LIPA
SCHEMBL19514016 0.73 LIPA (0.40) LIPA
SCHEMBL5467545 0.72 LIPA (0.38) LIPAEGLN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0454843-A4 METHOD AND APPARATUS FOR THE RAPID DEPOSITION BY CHEMICAL VAPOR DEPOSITION WITH LOW VAPOR PRESSURE REACTANTS GEORGIA TECH RES INST (US) 1994-12-28 EP claimed
EP-0454843-A1 METHOD AND APPARATUS FOR THE RAPID DEPOSITION BY CHEMICAL VAPOR DEPOSITION WITH LOW VAPOR PRESSURE REACTANTS GEORGIA TECH RESEARCH CORPORATION (US) 1991-11-06 EP claimed
WO-1991007236-A1 METHOD AND APPARATUS FOR THE RAPID DEPOSITION BY CHEMICAL VAPOR DEPOSITION WITH LOW VAPOR PRESSURE REACTANTS GEORGIA TECH RESEARCH CORPORATION (US) 1991-05-30 WO claimed