SCHEMBL9299347

SCHEMBL9299347

C=C(C)C(=O)OCc1cc(OC)cc(OC)c1

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.41
POLB P06746 1/20 0.41
MAPT P10636 1/20 0.40
FFAR4 Q5NUL3 1/20 0.39
TSHR P16473 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
MTNR1B P49286 1/20 0.39
ENPP2 Q13822 1/20 0.38
HIF1A Q16665 1/20 0.38
ALDH1A1 P00352 2/20 0.38
MEN1 O00255 2/20 0.38
CYP3A4 P08684 2/20 0.38
USP2 O75604 1/20 0.38
MAPK1 P28482 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
HPGD P15428 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10040732 0.86 ELANE (0.41) KMT2APOLBMAPTTSHRALDH1A1
SCHEMBL5072089 0.84 MMP1 (0.54) KMT2AMAPTMTNR1BALDH1A1MEN1
SCHEMBL30486011 0.84 MMP1 (0.54) KMT2AMAPTMTNR1BALDH1A1MEN1
SCHEMBL453318 0.83 ALDH1A1 (0.53) POLBMAPTALDH1A1SMN1; SMN2
SCHEMBL10040692 0.83 ELANE (0.41) KMT2APOLBTSHRALDH1A1CYP3A4
SCHEMBL3398453 0.82 ALDH1A1 (0.52) KMT2APOLBL3MBTL1MTNR1BHIF1A
SCHEMBL15339014 0.80 TSHR (0.42) KMT2APOLBTSHRALDH1A1MEN1
SCHEMBL27728499 0.80 KMT2A (0.49) KMT2APOLBL3MBTL1HIF1AALDH1A1
SCHEMBL7922433 0.80 HSP90AB1 (0.44) POLBTSHRALDH1A1CYP3A4
SCHEMBL29279179 0.80 MET (0.55) KMT2AMAPTTSHRALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100112474-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, METHOD FOR FORMING A PERMANENT PATTERN, AND PRINTED BOARD FUJIFILM CORPORATION (JP) 2010-05-06 US disclosed
US-20100112474-A1 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, METHOD FOR FORMING A PERMANENT PATTERN, AND PRINTED BOARD FUJIFILM CORPORATION (JP) 2010-05-06 US disclosed
US-5294511-A Positive photosensitive compounds for lithographic plates, proof sheets, drawings or semiconductor integrated circuits FUJI PHOTO FILM CO., LTD. (JP) 1994-03-15 US disclosed
US-5204217-A Compound that when radiated with actinic radiation produces a carboxylic acid FUJI PHOTO FILM CO., LTD. (JP) 1993-04-20 US disclosed