SCHEMBL9305881

SCHEMBL9305881

O=C(O)CCCC(Sc1nc2ccccc2[nH]1)C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.61
SMN1; SMN2 Q16637 4/20 0.59
LMNA P02545 4/20 0.50
POLB P06746 4/20 0.49
ALDH1A1 P00352 1/20 0.49
CHRM1 P11229 1/20 0.49
MAPT P10636 3/20 0.48
L3MBTL1 Q9Y468 1/20 0.46
NPC1 O15118 2/20 0.45
RAB9A P51151 2/20 0.45
KDM4E B2RXH2 1/20 0.45
BCHE P06276 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10759269 0.96 KMT2A (0.60) KMT2ASMN1; SMN2LMNAPOLBALDH1A1
SCHEMBL8973070 0.92 KMT2A (0.63) KMT2ASMN1; SMN2LMNAPOLBALDH1A1
SCHEMBL757400 0.85 KMT2A (0.67) KMT2ASMN1; SMN2LMNAPOLBALDH1A1
SCHEMBL754927 0.85 SMN1; SMN2 (0.65) KMT2ASMN1; SMN2LMNAPOLBALDH1A1
SCHEMBL10872581 0.82 POLB (0.70) KMT2ASMN1; SMN2LMNAPOLBALDH1A1
Hydroxyamine SCHEMBL7377020 0.82 KMT2A (0.54) KMT2ASMN1; SMN2LMNAPOLBALDH1A1
SCHEMBL10641547 0.78 KMT2A (0.62) KMT2ASMN1; SMN2LMNAPOLBMAPT
SCHEMBL10685902 0.78 LMNA (0.80) KMT2ASMN1; SMN2LMNAALDH1A1MAPT
SCHEMBL9304818 0.78 KMT2A (0.61) KMT2ASMN1; SMN2LMNAPOLBALDH1A1
SCHEMBL10762110 0.77 KMT2A (0.57) KMT2ASMN1; SMN2LMNAPOLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0542572-A1 Negative type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-05-19 EP claimed
US-5376498-A Blend of an alkali-soluble resin, compound that generates an acid upon irradiation, functional aromatic compound and a phenolic compound JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-12-27 US disclosed
US-5347008-A Thio(cyclo) alkanepolycarboxylic acids containing heterocyclic substituents CIBA-GEIGY CORPORATION (US) 1994-09-13 US disclosed
EP-0542572-A1 Negative type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-05-19 EP disclosed
US-5152929-A Corrosion inhibitors for water systems CIBA-GEIGY CORPORATION (US) 1992-10-06 US disclosed
US-4612049-A BENZOTHI ZOLYL THIO-, BENZIMIDAZOLYLTHIO- OR BENZOXAZOLYLTHIO-SUBSTITUTED CARBOXY ACID CIBA-GEIGY CORPORATION (US) 1986-09-16 US disclosed
EP-0183647-A1 Anti-corrosive aqueous paints CIBA-GEIGY AG (CH) 1986-06-04 EP disclosed
EP-0129506-A2 Heterocyclically substituted thio(cyclo)alkane polycarboxylic acids CIBA-GEIGY AG (CH) 1984-12-27 EP disclosed
EP-0128862-A2 Anti-corrosive coating composition CIBA-GEIGY AG (CH) 1984-12-19 EP disclosed