Benzophenone

Benzophenone

SCHEMBL9308337

CC(C)OC(C)C.O=C(c1ccccc1)c1ccccc1

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.64
ELANE P08246 2/20 0.56
ATM Q13315 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
SRD5A2 P31213 1/20 0.54
GABRA1 P14867 1/20 0.53
GABRB1 P18505 1/20 0.53
HPGD P15428 4/20 0.52
PTGS1 P23219 4/20 0.52
PTGS2 P35354 4/20 0.52
RAB9A P51151 4/20 0.52
SMN1; SMN2 Q16637 3/20 0.52
MAPT P10636 2/20 0.52
CXCR1 P25024 2/20 0.52
CXCR2 P25025 2/20 0.52
CYP3A4 P08684 2/20 0.52
HTT P42858 1/20 0.52
NPSR1 Q6W5P4 1/20 0.52
RECQL P46063 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzil SCHEMBL28144200 0.86 CES2 (0.64) ALDH1A1ATMTDP1L3MBTL1HPGD
Acetophenone SCHEMBL9307347 0.84 MAPT (0.54) ALDH1A1ATMTDP1L3MBTL1HPGD
Benzophenone SCHEMBL29127482 0.83 ALDH1A1 (0.74) ALDH1A1ELANEATMTDP1L3MBTL1
Benzophenone SCHEMBL28744509 0.81 ALDH1A1 (0.70) ALDH1A1ELANEATMTDP1L3MBTL1
Benzophenone SCHEMBL2955921 0.80 ALDH1A1 (0.78) ALDH1A1ELANEATMTDP1L3MBTL1
Benzophenone SCHEMBL5389322 0.80 ALDH1A1 (0.61) ALDH1A1ELANEATMTDP1L3MBTL1
Benzophenone SCHEMBL7454682 0.80 ALDH1A1 (0.88) ALDH1A1ELANEATMTDP1L3MBTL1
Benzophenone SCHEMBL6061130 0.80 ALDH1A1 (1.00) ALDH1A1ELANEATMTDP1L3MBTL1
Benzophenone SCHEMBL28491203 0.80 ALDH1A1 (1.00) ALDH1A1ELANEATMTDP1L3MBTL1
Benzophenone SCHEMBL30537001 0.80 ALDH1A1 (1.00) ALDH1A1ELANEATMTDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118162395-A Apparatus for a cleaning process and method for a cleaning process 三星电子株式会社 2024-06-11 CN disclosed
CN-118131583-A Diluent composition for removing coloring photosensitive resin 德山新勒克斯有限公司 2024-06-04 CN disclosed
CN-118119673-A Reactive dye and photosensitive composition using same 德山新勒克斯有限公司 2024-05-31 CN disclosed
CN-118119248-A Preparation method of pixel defining layer 德山新勒克斯有限公司 2024-05-31 CN disclosed
CN-118055647-A Preparation method of pixel defining layer 德山新勒克斯有限公司 2024-05-17 CN disclosed
CN-117998910-A Preparation method of pixel defining layer 德山新勒克斯有限公司 2024-05-07 CN disclosed
CN-117858597-A Preparation method of pixel defining layer 德山新勒克斯有限公司 2024-04-09 CN disclosed
CN-110007563-B Negative photosensitive resin composition, spacer, protective film, and liquid crystal display element 奇美实业股份有限公司 2024-04-02 CN disclosed
CN-117715489-A Preparation method of pixel defining layer 德山新勒克斯有限公司 2024-03-15 CN disclosed
CN-111435220-B Photosensitive resin composition, optical film, and method for producing same 新应材股份有限公司 2024-02-27 CN disclosed
CN-117590706-A Preparation method of pixel defining layer 德山新勒克斯有限公司 2024-02-23 CN disclosed
CN-117590707-A Preparation method of pixel defining layer 德山新勒克斯有限公司 2024-02-23 CN disclosed
CN-107463067-B Black photosensitive resin composition and application thereof 奇美实业股份有限公司 2024-01-26 CN disclosed
CN-116909096-A Photosensitive composition for forming light shielding layer of organic light emitting display device 德山新勒克斯有限公司 2023-10-20 CN disclosed
CN-116670589-A Resin, resin composition, and display device using same 德山新勒克斯有限公司 2023-08-29 CN disclosed
CN-108415221-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2023-07-28 CN disclosed
CN-116144345-A Quantum dot-ligand complex, photosensitive resin composition, optical film, electroluminescent diode, and electronic device 德山新勒克斯有限公司 2023-05-23 CN disclosed
CN-115997168-A Photosensitive resin composition with low reflectivity and light shielding layer using same 德山新勒克斯有限公司 2023-04-21 CN disclosed
US-5331103-A Reaction with hydrogen peroxide, hydroquinone from phenol RHONE-POULENC CHIMIE (FR) 1994-07-19 US disclosed