SCHEMBL9314635

SCHEMBL9314635

CN(C)c1ccc(C=[N+]([O-])c2ccc(C(=O)O)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.50
NPC1 O15118 4/20 0.50
MEN1 O00255 3/20 0.50
POLB P06746 2/20 0.50
ALDH1A1 P00352 6/20 0.48
MAPT P10636 6/20 0.48
LMNA P02545 3/20 0.48
JAK2 O60674 1/20 0.48
MITF O75030 1/20 0.48
CYP1A2 P05177 1/20 0.48
CYP3A4 P08684 1/20 0.48
CYP2C9 P11712 1/20 0.48
NTSR1 P30989 1/20 0.48
CYP2C19 P33261 1/20 0.48
TDP1 Q9NUW8 1/20 0.45
HPGD P15428 2/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
FBP1 P09467 1/20 0.43
TSHR P16473 2/20 0.43
HSD17B10 Q99714 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9315237 0.85 ALDH1A1 (0.51) KMT2AMEN1POLBALDH1A1MAPT
SCHEMBL31538762 0.83 NPC1 (0.48) KMT2ANPC1MEN1POLBALDH1A1
SCHEMBL1862852 0.81 ALDH1A1 (0.61) KMT2ANPC1MEN1POLBALDH1A1
SCHEMBL17250800 0.81 ALDH1A1 (0.61) KMT2ANPC1ALDH1A1MAPTTDP1
SCHEMBL18241562 0.81 G6PD (0.61) NPC1ALDH1A1MAPTTDP1FBP1
SCHEMBL9315878 0.80 EGFR (0.42) KMT2AMEN1POLBALDH1A1MAPT
SCHEMBL6372930 0.80 TSHR (0.54) KMT2ANPC1MEN1POLBALDH1A1
SCHEMBL9316413 0.79 CA1 (0.59) NPC1POLBALDH1A1MAPTTDP1
SCHEMBL33368 0.77 NPC1 (0.77) KMT2ANPC1MEN1POLBALDH1A1
SCHEMBL9315897 0.76 MAOB (0.55) KMT2ANPC1POLBMAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-5208949-A None JP disclosed
US-5310620-A Alkali-soluble nitrone compounds and contrast enhanced material comprising the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-05-10 US disclosed
JP-H05208949-A ALKALI-SOLUBLE NITRONE COMPOUND AND PHOTODECOLORING MATERIAL SHIN ETSU CHEM CO LTD 1993-08-20 JP disclosed