SCHEMBL9319485

SCHEMBL9319485

[SiH3]CC(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 6/20 0.46
KCNN4 O15554 4/20 0.41
TSHR P16473 2/20 0.41
ALDH1A1 P00352 1/20 0.41
TAAR1 Q96RJ0 1/20 0.39
CYP11B1 P15538 1/20 0.38
CYP11B2 P19099 1/20 0.38
CYP1A2 P05177 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
MAPK1 P28482 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9181548 0.79 ALDH1A1 (0.45) KIF11TSHRALDH1A1CYP1A2CYP2C9
SCHEMBL1149158 0.75 KIF11 (0.64) KIF11KCNN4TSHRALDH1A1TAAR1
SCHEMBL28873040 0.75 KIF11 (0.50) KIF11KCNN4TSHRALDH1A1TAAR1
SCHEMBL9300441 0.72 TAAR1 (0.58) KCNN4TSHRALDH1A1TAAR1CYP2C19
SCHEMBL766983 0.71 KIF11 (0.46) KIF11KCNN4TSHRALDH1A1TAAR1
SCHEMBL898911 0.71 KIF11 (0.46) KIF11KCNN4TSHRALDH1A1TAAR1
SCHEMBL17151091 0.71 TSHR (0.48) KIF11KCNN4TSHRALDH1A1TAAR1
SCHEMBL9146310 0.71 KIF11 (0.46) KIF11KCNN4TSHRALDH1A1TAAR1
SCHEMBL1971090 0.71 KCNN4 (0.48) KIF11KCNN4TSHRALDH1A1TAAR1
SCHEMBL913404 0.71 KIF11 (0.46) KIF11KCNN4TSHRALDH1A1TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0067066-B2 Dry-developing resist composition FUJITSU LTD (JP) 1994-01-12 EP claimed
EP-0067066-B1 DRY-DEVELOPING RESIST COMPOSITION FUJITSU LIMITED (JP) 1985-12-18 EP claimed
EP-0067067-B1 DRY-DEVELOPING NEGATIVE RESIST COMPOSITION FUJITSU LIMITED (JP) 1985-09-25 EP claimed
US-4481279-A Dry-developing resist composition FUJITSU LIMITED (JP) 1984-11-06 US claimed
US-4464455-A Dry-developing negative resist composition FUJITSU LIMITED (JP) 1984-08-07 US claimed
EP-0067066-A2 Dry-developing resist composition FUJITSU LIMITED (JP) 1982-12-15 EP claimed
EP-0067067-A2 Dry-developing negative resist composition FUJITSU LIMITED (JP) 1982-12-15 EP claimed
CN-117355373-B Ethylene oligomerization process 切弗朗菲利浦化学公司 2025-05-16 CN disclosed
CN-117355373-A Ethylene oligomerization process 切弗朗菲利浦化学公司 2024-01-05 CN disclosed
EP-0067066-B2 Dry-developing resist composition FUJITSU LTD (JP) 1994-01-12 EP disclosed
EP-0067066-B1 DRY-DEVELOPING RESIST COMPOSITION FUJITSU LIMITED (JP) 1985-12-18 EP disclosed
EP-0067067-B1 DRY-DEVELOPING NEGATIVE RESIST COMPOSITION FUJITSU LIMITED (JP) 1985-09-25 EP disclosed
US-4481279-A Dry-developing resist composition FUJITSU LIMITED (JP) 1984-11-06 US disclosed
US-4464455-A Dry-developing negative resist composition FUJITSU LIMITED (JP) 1984-08-07 US disclosed
EP-0067066-A2 Dry-developing resist composition FUJITSU LIMITED (JP) 1982-12-15 EP disclosed
EP-0067067-A2 Dry-developing negative resist composition FUJITSU LIMITED (JP) 1982-12-15 EP disclosed