Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR1I2 | O75469 | 1/20 | 0.44 |
| ▸ | CCR6 | P51684 | 1/20 | 0.34 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoquinone SCHEMBL10586825 | 0.77 | NR1I2 (0.49) | NR1I2MEN1MAPK1KMT2AALDH1A1 | |
| SCHEMBL13727573 | 0.71 | MAOA (0.46) | CCR6HKDC1MEN1MAPK1KMT2A | |
| SCHEMBL3290538 | 0.68 | CCR6 (0.37) | CCR6HKDC1MEN1MAPK1KMT2A | |
| SCHEMBL7918755 | 0.68 | MEN1 (0.35) | CCR6HKDC1MEN1MAPK1KMT2A | |
| SCHEMBL28583375 | 0.68 | MAPT (0.47) | HKDC1MEN1MAPK1KMT2AALDH1A1 | |
| SCHEMBL29214642 | 0.67 | CCR6 (0.40) | CCR6HKDC1MEN1MAPK1KMT2A | |
| SCHEMBL11577947 | 0.66 | CYP1A2 (0.53) | CCR6HKDC1MEN1MAPK1KMT2A | |
| Dibunic Acid SCHEMBL143895 | 0.65 | NR1I2 (0.71) | NR1I2MEN1KMT2AALDH1A1CYP1A2 | |
| Dibunic Acid SCHEMBL30080770 | 0.65 | NR1I2 (0.71) | NR1I2MEN1KMT2AALDH1A1CYP1A2 | |
| SCHEMBL6665985 | 0.65 | ALDH1A1 (0.48) | CCR6HKDC1MEN1MAPK1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0343666-B1 | Correct-reading images from photopolymer electrographic master | DU PONT (US) | 1994-08-03 | — | — | EP | disclosed |
| EP-0390103-A2 | High resolution superimposed images from photopolymer electrographic master | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-10-03 | — | — | EP | disclosed |
| US-4960660-A | RADIATION EXPOSURE, STRIPPING COVER SHEET, LAMINATION, PEELING TEMPORARY SURFACE, CHARGING, DEVELOPING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-10-02 | — | — | US | disclosed |
| US-4897327-A | Correct-reading images from photopolymer electrographic master | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-01-30 | — | — | US | disclosed |
| EP-0343666-A2 | Correct-reading images from photopolymer electrographic master | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-11-29 | — | — | EP | disclosed |
| EP-0315120-A2 | Photohardenable electrostatic master having improved backtransfer and charge decay | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-05-10 | — | — | EP | disclosed |
| EP-0315116-A2 | Photohardenable electrostatic master containing electron acceptor or donor | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-05-10 | — | — | EP | disclosed |
| US-4818660-A | POLYMERIC BINDER AND UNSATURATED COMPOUND, PHOTOINITIATOR, BAS IC DYE, LEUCO DYE AND STRONG ACID | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-04-04 | — | — | US | disclosed |
| US-4269933-A | PHOTOLITHOGRAPHY; POSITIVE AND NEGATIVE IMAGES; POLYMERIZATION OF A UNSATURATED POLYESTER USING A PHOTOSENSITIVE FREE RADICAL SYSTEM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-05-26 | — | — | US | disclosed |
| US-4198242-A | Photopolymerizable composition containing an o-nitroaromatic compound as photoinhibitor | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1980-04-15 | — | — | US | disclosed |
| US-4168981-A | Bis(substituted amino)sulfides as reversible inhibitor sources for photopolymerization | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1979-09-25 | — | — | US | disclosed |
| US-4029505-A | PHOTOPOLYMERIZABLE LAYER OF UNSATURATED COMPOUND, DINITROSO COMPOUND, AND FREE-RADICAL GENERATOR | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-06-14 | — | — | US | disclosed |