SCHEMBL9350357

SCHEMBL9350357

O=S1(=O)ON1c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 1/20 0.39
PTPN1 P18031 1/20 0.38
GSK3A P49840 3/20 0.37
GSK3B P49841 3/20 0.37
GAA P10253 3/20 0.37
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
CACNA1B Q00975 1/20 0.36
APBA1 Q02410 1/20 0.36
MAPK1 P28482 1/20 0.36
LMNA P02545 1/20 0.36
ELANE P08246 1/20 0.35
KDM4E B2RXH2 1/20 0.34
MAPT P10636 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
DDB1 Q16531 1/20 0.34
CRBN Q96SW2 1/20 0.34
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7032134 0.65 PTPN1 (0.45) MGLLPTPN1GSK3AGSK3BGAA
SCHEMBL2466051 0.63 LMNA (0.42) MGLLGSK3AGSK3BGAANPC1
SCHEMBL24776903 0.61 MGLL (0.44) MGLLGSK3AGSK3BGAANPC1
SCHEMBL24812484 0.59 MGLL (0.37) MGLLGSK3AGSK3BGAANPC1
SCHEMBL1722780 0.59 GSK3B (0.71) MGLLGSK3AGSK3BGAANPC1
SCHEMBL5306506 0.59 MAPK1 (0.71) MGLLGSK3AGSK3BGAANPC1
SCHEMBL11182628 0.59 MGLL (0.62) MGLLGSK3AGSK3BGAANPC1
SCHEMBL16280099 0.59 MGLL (0.62) MGLLGAAMEN1KMT2AGRK5
SCHEMBL23633132 0.58 MEN1 (0.41) GAAMEN1KMT2AMAPK1LMNA
SCHEMBL9509769 0.57 POLB (0.39) MGLLGSK3AGSK3BGAANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0320227-B1 Method of preventing polymer-scale formation SHINETSU CHEMICAL CO (JP) 1994-09-07 EP disclosed
US-4933399-A COATING INSIDE OF VESSEL WITH A CATIONIC DYE, DRYING, COATING WITH AN ANIONIC OR AMPHOTERIC POLYMER OR A HYDROXYL-CONTAINING COMPOUND IN A SOLVENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 1990-06-12 US disclosed