SCHEMBL9350852

SCHEMBL9350852

C=CC(=O)Nc1c2ccccc2nc2ccccc12

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.57
GAA P10253 6/20 0.57
GLA P06280 5/20 0.57
SMN1; SMN2 Q16637 3/20 0.57
ATM Q13315 2/20 0.57
ALDH1A1 P00352 2/20 0.57
HPGD P15428 1/20 0.57
PTPN1 P18031 1/20 0.56
PTPN11 Q06124 1/20 0.56
TGM2 P21980 2/20 0.55
POLB P06746 6/20 0.53
MAPT P10636 5/20 0.49
KMT2A Q03164 4/20 0.49
LMNA P02545 4/20 0.49
L3MBTL1 Q9Y468 3/20 0.49
KDM1A O60341 2/20 0.49
MITF O75030 2/20 0.49
RAD52 P43351 2/20 0.49
EPHX1 P07099 1/20 0.49
RECQL P46063 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13134395 0.87 KDM4E (0.51) KDM4EGAAGLASMN1; SMN2ATM
Hydrochloric Acid SCHEMBL7425068 0.79 PTPN1 (0.53) PTPN1PTPN11TGM2GSTO1
Dimethylamine SCHEMBL7539063 0.77 PTPN1 (0.51) SMN1; SMN2ALDH1A1PTPN1PTPN11TGM2
SCHEMBL3074031 0.77 KDM4E (0.71) KDM4EGAAGLASMN1; SMN2ATM
SCHEMBL557798 0.77 KDM4E (0.62) KDM4EGAAGLASMN1; SMN2ATM
SCHEMBL13656153 0.75 GAA (0.52) KDM4EGAAGLASMN1; SMN2ATM
SCHEMBL27820459 0.75 KDM4E (0.69) KDM4EGAAGLASMN1; SMN2ATM
SCHEMBL13134235 0.75 KDM4E (0.55) KDM4EGAAGLASMN1; SMN2ATM
SCHEMBL21092381 0.74 KDM4E (0.58) KDM4EGAAGLASMN1; SMN2ATM
SCHEMBL3818470 0.73 G6PD (0.48) KDM4EGAAGLAALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100247938-A1 MATERIAL FOR THREE-DIMENSIONAL MODELING, PROCESS FOR PRODUCING THREE-DIMENSIONAL MODEL, AND THREE-DIMENSIONAL MODEL FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed
US-20100247938-A1 MATERIAL FOR THREE-DIMENSIONAL MODELING, PROCESS FOR PRODUCING THREE-DIMENSIONAL MODEL, AND THREE-DIMENSIONAL MODEL FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed
EP-0374705-B1 Photopolymerisable compounds, photopolymerisable mixtures containing them and photopolymerisable recording material manufactured therefrom HOECHST AG (DE) 1994-09-21 EP disclosed
EP-0167963-B1 LIGHT-SENSITIVE COMPOSITION AND LIGHT SENSITIVE REGISTRATION MATERIAL PREPARED THEREWITH HOECHST AKTIENGESELLSCHAFT (DE) 1990-04-04 EP disclosed
US-4659645-A PRINTING PLATES; PHOTORESISTS HOECHST AKTIENGESELLSCHAFT (DE) 1987-04-21 US disclosed
CN-85106160-A Photosensitive composition and with this photosensitive material for preparing 1987-03-04 CN disclosed
EP-0167963-A2 Light-sensitive composition and light sensitive registration material prepared therewith HOECHST AKTIENGESELLSCHAFT (DE) 1986-01-15 EP disclosed
US-4088498-A Photopolymerizable copying composition HOECHST AKTIENGESELLSCHAFT (DT) 1978-05-09 US disclosed