Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.58 |
| ▸ | CES2 | O00748 | 1/20 | 0.57 |
| ▸ | MEN1 | O00255 | 2/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.56 |
| ▸ | GAA | P10253 | 2/20 | 0.56 |
| ▸ | USP2 | O75604 | 1/20 | 0.56 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.56 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.55 |
| ▸ | CA12 | O43570 | 3/20 | 0.55 |
| ▸ | CA1 | P00915 | 3/20 | 0.55 |
| ▸ | CA2 | P00918 | 3/20 | 0.55 |
| ▸ | CA7 | P43166 | 3/20 | 0.55 |
| ▸ | CA9 | Q16790 | 3/20 | 0.55 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | SELL | P14151 | 1/20 | 0.52 |
| ▸ | SELP | P16109 | 1/20 | 0.52 |
| ▸ | ESR1 | P03372 | 1/20 | 0.50 |
| ▸ | SHBG | P04278 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29450717 | 1.00 | HDAC1 (0.58) | HDAC1CES2MEN1KMT2AGAA | |
| SCHEMBL1397329 | 1.00 | HDAC1 (0.58) | HDAC1CES2MEN1KMT2AGAA | |
| SCHEMBL27789123 | 0.98 | HDAC1 (0.56) | HDAC1CES2MEN1KMT2AGAA | |
| SCHEMBL29375561 | 0.88 | HDAC1 (0.58) | HDAC1CES2MEN1KMT2AGAA | |
| SCHEMBL759926 | 0.88 | HDAC1 (0.58) | HDAC1CES2MEN1KMT2AGAA | |
| SCHEMBL29357695 | 0.87 | CES2 (0.73) | CES2MEN1KMT2AGAAUSP2 | |
| SCHEMBL39507 | 0.87 | CES2 (0.73) | CES2MEN1KMT2AGAAUSP2 | |
| SCHEMBL1758251 | 0.86 | MEN1 (0.59) | CES2MEN1KMT2AGAAUSP2 | |
| SCHEMBL3281937 | 0.86 | CES2 (0.55) | HDAC1CES2MEN1KMT2AGAA | |
| SCHEMBL1063407 | 0.85 | SELL (0.68) | HDAC1MEN1KMT2AALDH1A1SELL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 755 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10494483-B2 | Photosensitive resin composition, organic light emitting display device including the same, and method for manufacturing organic light emitting display device | SAMSUNG DISPLAY CO., LTD. (KR) | 2019-12-03 | — | — | US | claimed |
| US-20190339613-A1 | Photosensitive Material For Lift-Off Applications | GOLDEN JEREMY (US) | 2019-11-07 | — | — | US | claimed |
| US-10409162-B2 | Highly heat resistant polysilsesquioxane-based photosensitive resin composition | LTC CO., LTD. (KR) | 2019-09-10 | — | — | US | claimed |
| US-20170226294-A1 | PHOTOSENSITIVE RESIN COMPOSITION, ORGANIC LIGHT EMITTING DISPLAY DEVICE INCLUDING THE SAME, AND METHOD FOR MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY DEVICE | SAMSUNG DISPLAY CO., LTD. (KR) | 2017-08-10 | — | — | US | claimed |
| US-20170166700-A1 | HIGHLY HEAT RESISTANT POLYSILSESQUIOXANE-BASED PHOTOSENSITIVE RESIN COMPOSITION | LTC CO., LTD. (KR) | 2017-06-15 | — | — | US | claimed |
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| US-7008883-B2 | Photoresist composition for forming an insulation film, insulation film for organic electroluminescence devices and process for producing the insulation film | ZEON CORPORATION (JP) | 2006-03-07 | — | — | US | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| US-20040197696-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| EP-0827024-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2003-01-02 | — | — | EP | claimed |
| EP-0706090-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-03 | — | — | EP | claimed |
| US-5958645-A | ALKALI-SOLUBLE RESIN, PHENOL COMPOUND, 1,2-QUINONEDIAZIDE COMPOUND; RESOLUTION, SENSITIVITY, DEVELOPABILITY | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1999-09-28 | — | — | US | claimed |
| US-5798201-A | AN ALKALI SOLUBLE RESIN AND A 1,2-QUINONEDIAZIDE-5-SULFONATE COMPOUND OF POLYPHENOL; RESIN IS SUITABLE FOR USE AS A POSITIVE PHOTORESIST, EXHIBITS EXCELLENT DEVELOPABILITY, HEAT RESISTANCE AND HIGH RESOLUTION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-08-25 | — | — | US | claimed |
| EP-0827024-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-03-04 | — | — | EP | claimed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | claimed |
| US-5362598-A | Compositions for light sensitive elements with styryl dyes | SUMITOMO CHEMICAL CO., LTD. (JP) | 1994-11-08 | — | — | US | claimed |
| US-5283324-A | Reacting phenol compound and quinone diazide sulfonyl halide in solvent mixtures of different dielectric constants | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-02-01 | — | — | US | claimed |