Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAAR1 | Q96RJ0 | 4/20 | 0.46 |
| ▸ | SIGMAR1 | Q99720 | 4/20 | 0.46 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.46 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.46 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.46 |
| ▸ | MAOA | P21397 | 1/20 | 0.46 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.46 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.46 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.44 |
| ▸ | SLC18A2 | Q05940 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.42 |
| ▸ | LAP3 | P28838 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | PPARG | P37231 | 1/20 | 0.40 |
| ▸ | PPARA | Q07869 | 1/20 | 0.40 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.39 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.39 |
| ▸ | HTR2A | P28223 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL131560 | 0.81 | EPHX1 (0.48) | TAAR1SIGMAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL14667804 | 0.78 | SIGMAR1 (0.48) | TAAR1SIGMAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL8071578 | 0.78 | MMP12 (0.42) | PPARGPPARA | |
| SCHEMBL14667805 | 0.78 | TAAR1 (0.43) | TAAR1SIGMAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL112281 | 0.78 | TAAR1 (0.52) | TAAR1SIGMAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL14764261 | 0.78 | TAAR1 (0.52) | TAAR1SIGMAR1SLC6A2SLC6A4SLC6A3 | |
| Hydrochloric Acid SCHEMBL28400651 | 0.77 | EPHX1 (0.44) | TAAR1SIGMAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL9118343 | 0.77 | TAAR1 (0.42) | TAAR1SIGMAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL10501393 | 0.77 | TAAR1 (0.64) | TAAR1SIGMAR1 | |
| SCHEMBL13006663 | 0.76 | SIGMAR1 (0.56) | TAAR1SIGMAR1SLC6A2SLC6A4SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9632410-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9632410-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-20160018732-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, PHOTOMASK AND PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-21 | — | — | US | disclosed |
| US-20160018732-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, PHOTOMASK AND PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-21 | — | — | US | disclosed |
| US-8673538-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| US-8673538-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-03-18 | — | — | US | disclosed |
| WO-2013018524-A1 | PHOTOSENSITIVE RESIN COMPOSITION, MATERIAL FOR FORMING RELIEF PATTERN, PHOTOSENSITIVE FILM, POLYIMIDE FILM, CURED RELIEF PATTERN AND METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 (JP) | 2013-02-07 | — | — | WO | disclosed |
| US-20130029255-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-31 | — | — | US | disclosed |
| US-5952390-A | ANTIINFLAMMATORY AGENTS; TREATMENT FOR PSORIASIS | TEVA PHARMACEUTICAL INDUSTRIES LTD. (IL) | 1999-09-14 | — | — | US | disclosed |
| US-5844004-A | 10-substituted 1,8-dihydroxy-9 (10H) anthracenone pharmaceuticals | TEVA PHARMACEUTICAL INDUSTRIES, LTD. (IL) | 1998-12-01 | — | — | US | disclosed |
| US-5661187-A | ADMINISTERING TO TREAT AN ALLERGIC OR INFLAMMATORY CONDITION; SIDE EFFECT REDUCTION | TEVA PHARMACEUTICAL INDUSTRIES, LTD. (IL) | 1997-08-26 | — | — | US | disclosed |
| EP-0465835-B1 | Anionic living polymers, their derivatives and composition comprising them | DAINIPPON INK & CHEMICALS (JP) | 1996-05-01 | — | — | EP | disclosed |
| EP-0664780-A1 | 10-SUBSTITUTED 1,8-DIHYDROXY-9(10H) ANTHRACENONE PHARMACEUTICALS | TEVA PHARMACEUTICAL INDUSTRIES LTD. (IL) | 1995-08-02 | — | — | EP | disclosed |
| US-5426197-A | Antiinflammatory, antiallergy or antitumor agents | TEVA PHARMACEUTICAL INDUSTRIES, LTD. (IL) | 1995-06-20 | — | — | US | disclosed |
| WO-1995003266-A1 | 10-SUBSTITUTED 1,8-DIHYDROXY-9(10H) ANTHRACENONE PHARMACEUTICALS | TEVA PHARMACEUTICAL INDUSTRIES, LTD. (IL) | 1995-02-02 | — | — | WO | disclosed |
| US-5241002-A | High-solid paints, adhesives and coatings from a curable hydrolyzed acetal or ketal-containing methacrylic ester polymer and isocyanate hardener | DAINIPPON INK AND CHEMICALS, LTD. (JP) | 1993-08-31 | — | — | US | disclosed |
| US-5194547-A | Methacrylic acid ester polymer containing at least one acetal or ketal group; paints, adhesives, molding materials | DAINIPPON INK & CHEMICALS, INC. (JP) | 1993-03-16 | — | — | US | disclosed |
| EP-0465835-A1 | Anionic living polymers, their derivatives and composition comprising them | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1992-01-15 | — | — | EP | disclosed |