SCHEMBL9396104

SCHEMBL9396104

CC(=O)C(CCOCCC(C(C)=O)C(=O)O)C(=O)O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOS3 P29474 2/20 0.43
NOS1 P29475 2/20 0.43
NOS2 P35228 2/20 0.43
CHRM1 P11229 1/20 0.33
AKR1A1 P14550 1/20 0.33
CHRM3 P20309 1/20 0.33
HTR2A P28223 1/20 0.33
HTR2C P28335 1/20 0.33
ADRA1A P35348 1/20 0.33
HRH1 P35367 1/20 0.33
DRD3 P35462 1/20 0.33
SLC6A3 Q01959 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
GABRR1 P24046 2/20 0.31
CYP1A2 P05177 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8414187 0.91 NOS3 (0.39) NOS3NOS1NOS2CHRM1AKR1A1
SCHEMBL9782826 0.89 ALDH1A1 (0.45) NOS3NOS1NOS2CHRM1AKR1A1
SCHEMBL6133300 0.88 ALDH1A1 (0.50) NOS3NOS1NOS2CHRM1CHRM3
SCHEMBL5972162 0.88 TSHR (0.43) NOS3NOS1NOS2ALDH1A1TSHR
SCHEMBL1454096 0.83 TDP1 (0.34) NOS3NOS1NOS2TDP1
SCHEMBL441261 0.83 ALDH1A1 (0.37) NOS3NOS1NOS2CHRM1AKR1A1
SCHEMBL6133265 0.82 TDP1 (0.37) NOS3NOS1NOS2TDP1ALDH1A1
SCHEMBL9516593 0.81 NOS3 (0.38) NOS3NOS1NOS2CHRM1AKR1A1
SCHEMBL9392724 0.81 CHRM1 (0.41) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL20421661 0.77 GABRR1 (0.37) CHRM1AKR1A1CHRM3HTR2AHTR2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-6033035-A None JP disclosed
JP-H0633035-A USE OF POLYALKYLENEGLYCOL DIESTER AS FORMALDEHYDE COLLECTOR AND FINISHING PROCESS FOR TEXTILE INDUSTRY SOC FR HOECHST 1994-02-08 JP disclosed