⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2940414 | 0.83 | — | — | |
| SCHEMBL11541273 | 0.81 | — | — | |
| SCHEMBL11766099 | 0.81 | — | — | |
| SCHEMBL5016547 | 0.79 | — | — | |
| SCHEMBL513814 | 0.79 | — | — | |
| SCHEMBL6282587 | 0.77 | — | — | |
| SCHEMBL183520 | 0.77 | SIGMAR1 (0.32) | — | |
| SCHEMBL28247117 | 0.77 | SLC6A3 (0.36) | — | |
| SCHEMBL247603 | 0.75 | — | — | |
| SCHEMBL5015685 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12552958-B2 | Two-component outer coating containing polyaspartic acid esters | COVESTRO DEUTSCHLAND AG (DE) | 2026-02-17 | — | — | US | disclosed |
| US-20250263578-A1 | Novel two-component clear-coat systems comprising polyaspartic acid ester | COVESTRO DEUTSCHLAND AG (DE) | 2025-08-21 | — | — | US | disclosed |
| US-20250230337-A1 | POLYASPARTATE-BASED TWO-COMPONENT COATING COMPOSITIONS FOR PRODUCING COATINGS HAVING GOOD SELF-HEALING PROPERTIES COUPLED WITH LOW TACKINESS | COVESTRO DEUTSCHLAND AG (DE) | 2025-07-17 | — | — | US | disclosed |
| US-12338360-B2 | Two-component clear coat systems comprising polyaspartic acid ester | COVESTRO DEUTSCHLAND AG (DE) | 2025-06-24 | — | — | US | disclosed |
| US-12241001-B2 | Systems for priming and adhesion of flooring | COVESTRO DEUTSCHLAND AG (DE) | 2025-03-04 | — | — | US | disclosed |
| EP-4511411-A1 | POLYASPARTATE-BASED TWO-COMPONENT COATING COMPOSITIONS FOR PRODUCING COATINGS HAVING GOOD SELF-HEALING PROPERTIES COUPLED WITH LOW TACKINESS | Covestro Deutschland AG (DE) | 2025-02-26 | — | — | EP | disclosed |
| US-20250043146-A1 | MULTILAYER CONSTRUCTION ON METAL SUBSTRATES BASED ON POLYASPARTATE COATINGS | COVESTRO DEUTSCHLAND AG (DE) | 2025-02-06 | — | — | US | disclosed |
| EP-4453107-A1 | MULTILAYER CONSTRUCTION ON METAL SUBSTRATES BASED ON POLYASPARATE COATINGS | Covestro Deutschland AG (DE) | 2024-10-30 | — | — | EP | disclosed |
| US-20240336805-A1 | NEW TWO-COMPONENT COATING SYSTEMS CONTAINING POLYASPARTIC ACID ESTERS | COVESTRO DEUTSCHLAND AG (DE) | 2024-10-10 | — | — | US | disclosed |
| EP-4388025-A1 | NEW TWO-COMPONENT COATING SYSTEMS CONTAINING POLYASPARTIC ACID ESTERS | Covestro Deutschland AG (DE) | 2024-06-26 | — | — | EP | disclosed |
| US-11667747-B2 | Binders containing secondary amine groups, based on cyclic ethers | COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) | 2023-06-06 | — | — | US | disclosed |
| WO-2023020960-A1 | NEW TWO-COMPONENT COATING SYSTEMS CONTAINING POLYASPARTIC ACID ESTERS | COVESTRO DEUTSCHLAND AG (DE) | 2023-02-23 | — | — | WO | disclosed |
| EP-4137524-A1 | NOVEL TWO-COMPONENT COATING SYSTEMS CONTAINING POLYASPARTIC ACID ESTER | Covestro Deutschland AG (DE) | 2023-02-22 | — | — | EP | disclosed |
| US-20220144998-A1 | BINDERS CONTAINING SECONDARY AMINE GROUPS, BASED ON CYCLIC ETHERS | COVESTRO DEUTSCHLAND AG (DE) | 2022-05-12 | — | — | US | disclosed |
| US-20220145121-A1 | NOVEL TWO-COMPONENT OUTER COATING CONTAINING POLYASPARTIC ACID ESTERS | COVESTRO DEUTSCHLAND AG (DE) | 2022-05-12 | — | — | US | disclosed |
| US-20220098437-A1 | NOVEL TWO-COMPONENT CLEAR COAT SYSTEMS COMPRISING POLYASPARTIC ACID ESTER | COVESTRO DEUTSCHLAND AG (DE) | 2022-03-31 | — | — | US | disclosed |
| US-5328966-A | Polyamide-siloxane block polymers crosslinked with polyglycidyl compound | TOSHIBA SILICONE CO., LTD. (JP) | 1994-07-12 | — | — | US | disclosed |
| US-5004793-A | Polysiloxane-Polyamide Block Copolymer, Crosslinking Agent, Curing Catalyst | TOSHIBA SILICONE CO., LTD. (JP) | 1991-04-02 | — | — | US | disclosed |
| US-4882396-A | Siloxane-amide block copolymer and process for producing the same | TOSHIBA SILICONE CO., LTD. (JP) | 1989-11-21 | — | — | US | disclosed |
| US-4877855-A | PROCESSIBILITY, CURABILITY | TOSHIBA SILICONE CO., LTD. (JP) | 1989-10-31 | — | — | US | disclosed |