Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP3 | P08254 | 1/20 | 0.32 |
| ▸ | MMP8 | P22894 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 2/20 | 0.31 |
| ▸ | CA1 | P00915 | 2/20 | 0.31 |
| ▸ | CA2 | P00918 | 2/20 | 0.31 |
| ▸ | CA4 | P22748 | 2/20 | 0.31 |
| ▸ | CA9 | Q16790 | 2/20 | 0.31 |
| ▸ | EHMT2 | Q96KQ7 | 2/20 | 0.31 |
| ▸ | EHMT1 | Q9H9B1 | 2/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10162448 | 0.73 | LMNA (0.43) | LMNAMMP1MMP2MMP3MMP8 | |
| SCHEMBL5846213 | 0.72 | — | — | |
| SCHEMBL9404049 | 0.70 | TDP1 (0.36) | CA4 | |
| SCHEMBL9076012 | 0.68 | LMNA (0.43) | LMNAMMP1MMP2MMP3MMP8 | |
| SCHEMBL8748923 | 0.67 | CES1 (0.33) | LMNACA4 | |
| SCHEMBL14665253 | 0.67 | DPP4 (0.36) | LMNAMMP1MMP2MMP3MMP8 | |
| SCHEMBL81646 | 0.66 | — | — | |
| SCHEMBL20849668 | 0.65 | LMNA (0.37) | LMNAMMP1MMP2MMP3MMP8 | |
| SCHEMBL962321 | 0.65 | GLO1 (0.47) | LMNARAB9ASMN1; SMN2 | |
| Hydrochloric Acid SCHEMBL668539 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5272036-A | Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method | MATSUSHITA ELECTRONIC INDUSTRIAL CO., LTD. (JP) | 1993-12-21 | — | — | US | disclosed |