Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | SLC15A2 | Q16348 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | SLC13A3 | Q8WWT9 | 1/20 | 0.32 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.32 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | THPO | P40225 | 1/20 | 0.30 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.30 |
| ▸ | LCK | P06239 | 1/20 | 0.30 |
| ▸ | FYN | P06241 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9404049 | 0.82 | TDP1 (0.36) | CES1CA4ALDH1A1FFAR3 | |
| SCHEMBL5846213 | 0.80 | — | — | |
| SCHEMBL8749106 | 0.80 | ALDH1A1 (0.46) | LMNAALDH1A1 | |
| SCHEMBL81646 | 0.78 | — | — | |
| SCHEMBL9404036 | 0.77 | ALDH1A1 (0.56) | MAPK1ALDH1A1 | |
| Methylene Chloride SCHEMBL27550579 | 0.75 | TSHR (0.35) | TSHR | |
| SCHEMBL3537492 | 0.73 | CES2 (0.48) | CES1ALDH1A1TSHRFFAR3 | |
| SCHEMBL20361923 | 0.72 | — | — | |
| Carbamic Acid SCHEMBL11020831 | 0.72 | ACHE (0.35) | LMNA | |
| SCHEMBL8749059 | 0.71 | CES1 (0.57) | CES1LMNAMAPK1ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5627006-A | ALKENYLOXY-SUBSTITUTED POLYVINYLPHENOLS, PHOTOSENSITIVE ACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-05-06 | — | — | US | disclosed |
| EP-0552548-B1 | Resist material | WAKO PURE CHEM IND LTD (JP) | 1997-03-19 | — | — | EP | disclosed |
| US-5272036-A | Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method | MATSUSHITA ELECTRONIC INDUSTRIAL CO., LTD. (JP) | 1993-12-21 | — | — | US | disclosed |
| EP-0552548-A1 | Resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1993-07-28 | — | — | EP | disclosed |