SCHEMBL9468533

SCHEMBL9468533

COC(C)OCN1C(=O)C=CC1=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 11/20 0.43
FAAH O00519 4/20 0.43
ALDH1A1 P00352 3/20 0.43
LMNA P02545 2/20 0.43
MAPT P10636 2/20 0.43
NPSR1 Q6W5P4 2/20 0.43
BLM P54132 2/20 0.43
GMNN O75496 1/20 0.43
THPO P40225 1/20 0.43
PMP22 Q01453 1/20 0.43
HPGD P15428 2/20 0.41
HSP90AA1 P07900 2/20 0.41
TLR9 Q9NR96 1/20 0.41
TP53 P04637 1/20 0.41
PKM P14618 1/20 0.41
XBP1 P17861 1/20 0.41
MAPK1 P28482 1/20 0.41
HTT P42858 1/20 0.41
RECQL P46063 1/20 0.41
RAB9A P51151 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8391712 0.84 MGLL (0.53) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL9468434 0.82 LMNA (0.48) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL17787298 0.80 MGLL (0.48) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL16426680 0.75 MGLL (0.57) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL14199493 0.72 MGLL (0.44) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL22805559 0.72 MGLL (0.44) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL277926 0.72 MGLL (0.55) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL22002013 0.71 MGLL (0.57) MGLLFAAHALDH1A1LMNAMAPT
SCHEMBL9922280 0.70
SCHEMBL8161159 0.70 MGLL (0.46) MGLLFAAHALDH1A1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5200529-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1993-04-06 US disclosed
US-5081001-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1992-01-14 US disclosed
US-4962171-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1990-10-09 US disclosed
US-4810613-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1989-03-07 US disclosed
EP-0291994-A2 Photoresist composition and photoresist material prepared therefrom, containing blocked monomer imide groups, and a suitable maleic-acid monomer HOECHST AKTIENGESELLSCHAFT (DE) 1988-11-23 EP disclosed