SCHEMBL9468434

SCHEMBL9468434

CCOC(C)OCN1C(=O)C=CC1=O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.48
MGLL Q99685 11/20 0.46
ALDH1A1 P00352 3/20 0.46
BLM P54132 2/20 0.46
MAPT P10636 2/20 0.46
NPSR1 Q6W5P4 2/20 0.46
GMNN O75496 1/20 0.46
THPO P40225 1/20 0.46
PMP22 Q01453 1/20 0.46
HPGD P15428 2/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2C19 P33261 1/20 0.44
WRN Q14191 1/20 0.44
HIF1A Q16665 1/20 0.44
GSK3A P49840 4/20 0.43
GSK3B P49841 4/20 0.43
FAAH O00519 5/20 0.38
PTGS1 P23219 4/20 0.38
PTGS2 P35354 4/20 0.38
HSP90AA1 P07900 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9468533 0.82 MGLL (0.43) LMNAMGLLALDH1A1BLMMAPT
SCHEMBL17787298 0.79 MGLL (0.48) LMNAMGLLALDH1A1BLMMAPT
Benzoquinone SCHEMBL18838186 0.76 LMNA (0.60) LMNAALDH1A1BLMPTGS2PKM
SCHEMBL14199491 0.74 MGLL (0.45) LMNAMGLLALDH1A1BLMMAPT
SCHEMBL4593870 0.73 MGLL (0.48) LMNAMGLLALDH1A1BLMMAPT
SCHEMBL16426680 0.73 MGLL (0.57) LMNAMGLLALDH1A1BLMMAPT
SCHEMBL722108 0.73 LMNA (0.63) LMNAPTGS2PKM
SCHEMBL5670902 0.73 LMNA (0.63) LMNAPTGS2PKM
SCHEMBL7098928 0.73 GSK3A (0.45) LMNAMGLLALDH1A1BLMMAPT
SCHEMBL28365540 0.72 MGLL (0.56) LMNAMGLLALDH1A1BLMMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5200529-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1993-04-06 US disclosed
US-5081001-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1992-01-14 US disclosed
US-4962171-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1990-10-09 US disclosed
US-4810613-A Blocked monomer and polymers therefrom for use as photoresists HOECHST CELANESE CORPORATION (US) 1989-03-07 US disclosed
EP-0291994-A2 Photoresist composition and photoresist material prepared therefrom, containing blocked monomer imide groups, and a suitable maleic-acid monomer HOECHST AKTIENGESELLSCHAFT (DE) 1988-11-23 EP disclosed