SCHEMBL9474175

SCHEMBL9474175

CCNc1ccc2ccc(=O)oc2c1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DRD4 P21917 7/20 0.67
KDM4E B2RXH2 5/20 0.59
ALDH1A1 P00352 5/20 0.59
HPGD P15428 3/20 0.59
HSD17B10 Q99714 3/20 0.59
CASP1 P29466 2/20 0.59
CASP7 P55210 2/20 0.59
POLB P06746 1/20 0.59
RECQL P46063 1/20 0.59
CA12 O43570 6/20 0.53
CA1 P00915 6/20 0.53
CA9 Q16790 6/20 0.53
CA7 P43166 5/20 0.53
CA14 Q9ULX7 5/20 0.53
CA6 P23280 4/20 0.53
CA5B Q9Y2D0 4/20 0.53
CA4 P22748 4/20 0.53
CA5A P35218 4/20 0.53
GLA P06280 2/20 0.53
CYP1A2 P05177 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20419216 0.88 ALDH1A1 (0.61) DRD4KDM4EALDH1A1HPGDHSD17B10
SCHEMBL3197214 0.81 DRD4 (0.69) DRD4KDM4EALDH1A1HPGDHSD17B10
SCHEMBL22899134 0.81 DRD4 (0.69) DRD4KDM4EALDH1A1HPGDHSD17B10
SCHEMBL5567249 0.80 DRD4 (0.58) DRD4KDM4EALDH1A1HPGDHSD17B10
SCHEMBL798583 0.79 DRD4 (0.61) DRD4KDM4EALDH1A1HPGDHSD17B10
SCHEMBL27693079 0.79 KDM4E (0.48) DRD4KDM4EALDH1A1HPGDHSD17B10
SCHEMBL19410755 0.79 HSD17B3 (0.55) DRD4KDM4EALDH1A1HPGDHSD17B10
SCHEMBL13074648 0.79 KDM4E (0.48) DRD4KDM4EALDH1A1HPGDHSD17B10
SCHEMBL10024912 0.78 KDM4E (0.64) DRD4KDM4EALDH1A1HPGDHSD17B10
SCHEMBL11118650 0.77 DRD4 (0.58) DRD4KDM4EALDH1A1HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0574546-A1 PEEL-APART PHOTOSENSITIVE ELEMENT E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-12-22 EP disclosed
US-5234790-A Peel-apart photosensitive element E. I. DU PONT DE NEMOURS AND COMPANY (US) 1993-08-10 US disclosed
US-5192613-A Antimony doped tin oxide E. I. DU PONT DE NEMOURS AND COMPANY (US) 1993-03-09 US disclosed
WO-1992015920-A2 PEEL-APART PHOTOSENSITIVE ELEMENT E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-09-17 WO disclosed
CN-1054139-A The electrostatic imaging material low to moisture sensitivity DU PONT (US) 1991-08-28 CN disclosed
EP-0439161-A2 Electrographic recording element with reduced humidity sensitivity E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-07-31 EP disclosed
CN-1051435-A Use the reversal process of photosensitive peel material DU PONT (US) 1991-05-15 CN disclosed
EP-0412495-A2 Image-reversal process using photosensitive peel-apart elements E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-02-13 EP disclosed
US-4987051-A POSITIVE IMAGE OF TRANSPARENCY ON COVERSHEET AND NEGATIVE IMAGE OF TRANSPARENCY ON ELASTOMERIC LAYER E. I. DU PONT DE NEMOURS AND COMPANY (US) 1991-01-22 US disclosed