Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | CA6 | P23280 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | PARP1 | P09874 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | CASP6 | P55212 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | HTR2A | P28223 | 1/20 | 0.30 |
| ▸ | HTR2C | P28335 | 1/20 | 0.30 |
| ▸ | HRH1 | P35367 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.30 |
| ▸ | ACHE | P22303 | 2/20 | 0.30 |
| ▸ | PIN1 | Q13526 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11574711 | 0.87 | CA1 (0.31) | CA1CA2CA4CA6 | |
| SCHEMBL10476775 | 0.82 | MAOA (0.39) | CYP1A2CYP2A6HTR2AHTR2CHRH1 | |
| SCHEMBL36333 | 0.82 | MAOA (0.39) | CYP1A2CYP2A6HTR2AHTR2CHRH1 | |
| SCHEMBL9160477 | 0.82 | MAOA (0.39) | CYP1A2CYP2A6HTR2AHTR2CHRH1 | |
| Hydrochloric Acid SCHEMBL585839 | 0.80 | MAOA (0.37) | CYP1A2CYP2A6HTR2AHTR2CHRH1 | |
| Ammonia Solution, Strong SCHEMBL1871983 | 0.80 | MAOA (0.37) | CYP1A2CYP2A6HTR2AHTR2CHRH1 | |
| SCHEMBL82772 | 0.79 | ALDH1A1 (0.34) | CYP2A6MEN1GAAKMT2AHTR2A | |
| SCHEMBL166362 | 0.79 | — | — | |
| SCHEMBL11516655 | 0.79 | CA1 (0.33) | CA1CA2CA4CA6CYP1A2 | |
| SCHEMBL15411118 | 0.79 | ALDH1A1 (0.34) | CYP2A6MEN1GAAKMT2AHTR2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4739648-A1 | PHOTOISOMERIZATION OF GERANIAL AND NERAL | BASF SE (DE) | 2026-05-13 | — | — | EP | claimed |
| WO-2025011972-A1 | PHOTOISOMERIZATION OF GERANIAL AND NERAL | BASF SE (DE) | 2025-01-16 | — | — | WO | claimed |
| EP-4739648-A1 | PHOTOISOMERIZATION OF GERANIAL AND NERAL | BASF SE (DE) | 2026-05-13 | — | — | EP | disclosed |
| WO-2025108852-A1 | PROCESS FOR THE PREPARATION OF UNSATURATED ESTERS | BASF SE (DE) | 2025-05-30 | — | — | WO | disclosed |
| WO-2025011972-A1 | PHOTOISOMERIZATION OF GERANIAL AND NERAL | BASF SE (DE) | 2025-01-16 | — | — | WO | disclosed |
| US-20240012326-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-01-11 | — | — | US | disclosed |
| CN-116830038-A | Photosensitive element and method for forming resist pattern | 旭化成株式会社 | 2023-09-29 | — | — | CN | disclosed |
| CN-115398337-A | Photosensitive element and method for forming resist pattern | 旭化成株式会社 | 2022-11-25 | — | — | CN | disclosed |
| WO-2022163652-A1 | PHOTOSENSITIVE ELEMENT, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2022-08-04 | — | — | WO | disclosed |
| CN-104583867-B | Photosensitive film laminate, flexible printed wiring board, and method for producing same | 旭化成株式会社 | 2020-03-17 | — | — | CN | disclosed |
| US-5179546-A | Magneto-optical disk and process for manufacturing the same | HITACHI, LTD. (JP) | 1993-01-12 | — | — | US | disclosed |