⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28770306 | 0.81 | TSHR (0.31) | — | |
| SCHEMBL14118047 | 0.79 | TSHR (0.31) | — | |
| SCHEMBL8014080 | 0.79 | TSHR (0.31) | — | |
| SCHEMBL1852554 | 0.74 | THRB (0.36) | — | |
| SCHEMBL1644236 | 0.71 | THRB (0.37) | — | |
| SCHEMBL5163889 | 0.71 | TSHR (0.30) | — | |
| SCHEMBL1770458 | 0.71 | TSHR (0.33) | — | |
| SCHEMBL1852556 | 0.70 | THRB (0.36) | — | |
| SCHEMBL1602185 | 0.70 | TSHR (0.35) | — | |
| SCHEMBL5794376 | 0.70 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0348063-B1 | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1993-05-26 | — | — | EP | disclosed |
| US-5053316-A | THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1991-10-01 | — | — | US | disclosed |
| EP-0348063-A1 | Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1989-12-27 | — | — | EP | disclosed |