Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.44 |
| ▸ | MAOB | P27338 | 1/20 | 0.43 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.38 |
| ▸ | PTPRC | P08575 | 1/20 | 0.38 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.38 |
| ▸ | PTPRA | P18433 | 1/20 | 0.38 |
| ▸ | PTPRB | P23467 | 1/20 | 0.38 |
| ▸ | PTPRE | P23469 | 1/20 | 0.38 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.38 |
| ▸ | GFER | P55789 | 1/20 | 0.38 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.38 |
| ▸ | TTR | P02766 | 1/20 | 0.37 |
| ▸ | TPMT | P51580 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 4/20 | 0.36 |
| ▸ | MEN1 | O00255 | 4/20 | 0.36 |
| ▸ | THRB | P10828 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1462336 | 0.89 | KDM4E (0.48) | KDM4EMAOBPTPN1PTPRCPTPN2 | |
| SCHEMBL2954701 | 0.81 | CASP7 (0.48) | KDM4EMAOBPTPN1PTPRCPTPN2 | |
| SCHEMBL958617 | 0.79 | KDM4E (0.41) | KDM4EPTPN1PTPRCPTPN2PTPRA | |
| SCHEMBL7821086 | 0.79 | KDM4E (0.41) | KDM4EMAOBPTPN1PTPRCPTPN2 | |
| SCHEMBL3564724 | 0.79 | KDM4E (0.41) | KDM4EPTPN1PTPRCPTPN2PTPRA | |
| SCHEMBL857080 | 0.79 | KDM4E (0.66) | KDM4EPTPN1PTPRCPTPN2PTPRA | |
| SCHEMBL5755662 | 0.79 | KEAP1 (0.50) | KDM4EPTPN1KMT2AGFERRXFP1 | |
| SCHEMBL951022 | 0.79 | CYP3A4 (0.55) | KDM4EKMT2ATPMTMAPTMEN1 | |
| SCHEMBL17873477 | 0.79 | KDM4E (0.50) | KDM4EKMT2AGFERRXFP1TPMT | |
| SCHEMBL30625240 | 0.79 | KDM4E (0.66) | KDM4EKMT2AGFERRXFP1TTR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118184679-A | Photothermal agent and preparation method thereof, photothermal nanoparticle and preparation method thereof, insulating material and self-repairing method of insulating material | 中国石油天然气股份有限公司 | 2024-06-14 | — | — | CN | claimed |
| US-6756486-B1 | LAKED DISAZO YELLOW PIGMENTS HAVING DESIRABLE GREEN SHADE, HEAT STABILITY, GOOD STRENGTH, BLEED RESISTANCE, MIGRATION RESISTANCE, AND LOW OR NO TOXICITY | ENGELHARD CORPORATION | 2004-06-29 | — | — | US | claimed |
| WO-2026100524-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, ONIUM SALT COMPOUND, AND POLYMER | JSR株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2025004967-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2025-01-02 | — | — | WO | disclosed |
| WO-2024176701-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2024-08-29 | — | — | WO | disclosed |
| WO-2024127977-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-20 | — | — | WO | disclosed |
| CN-118184679-A | Photothermal agent and preparation method thereof, photothermal nanoparticle and preparation method thereof, insulating material and self-repairing method of insulating material | 中国石油天然气股份有限公司 | 2024-06-14 | — | — | CN | disclosed |
| WO-2024122425-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-6066638-A | CONTROLLING PLANT DISEASES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-05-23 | — | — | US | disclosed |
| WO-2000001692-A1 | SALTS OF PAROXETINE | SMITHKLINE BEECHAM PLC (GB) | 2000-01-13 | — | — | WO | disclosed |
| EP-0560722-B1 | Chromogenic lactam compounds, their production and use | CIBA SC HOLDING AG (CH) | 1999-11-17 | — | — | EP | disclosed |
| EP-0694809-B1 | A novel class of grain growth modifiers for the preparation of high chloride (111) tabular grain emulsions (II) | EASTMAN KODAK CO (US) | 1999-10-06 | — | — | EP | disclosed |
| EP-0836602-A1 | FUNGICIDAL PYRIMIDINONES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-04-22 | — | — | EP | disclosed |
| WO-1997002262-A1 | FUNGICIDAL PYRIMIDINONES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-01-23 | — | — | WO | disclosed |
| US-5362872-A | Used in pressure sensitive or heat sensitive recording | CIBA-GEIGY CORPORATION (US) | 1994-11-08 | — | — | US | disclosed |
| EP-0560722-A1 | Chromogenic lactam compounds, their production and use | CIBA-GEIGY AG (CH) | 1993-09-15 | — | — | EP | disclosed |
| US-4172098-A | REACTION OF A HALOAMINOBENZOIC ACID WITH AN ALCOHOL AND NITROSYLATING AGENT IN THE PRESCENCE OF AN ACID AND WATER | BASF AKTIENGESELLSCHAFT (DE) | 1979-10-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | RER1, RFT1, RAD51 | KDM4E 1445/4885MAOB 3559/4885PTPN1 4336/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.