SCHEMBL9547770

SCHEMBL9547770

CCCCCCOC(C)c1ccc(-c2ccc(OCc3ccccc3)cc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
PLA2G10 O15496 2/20 0.49
PLA2G2A P14555 2/20 0.49
RARB P10826 3/20 0.48
ACACB O00763 1/20 0.47
MEN1 O00255 1/20 0.45
RAB9A P51151 1/20 0.45
KMT2A Q03164 1/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
FFAR1 O14842 1/20 0.45
LTA4H P09960 1/20 0.44
ENPP3 O14638 1/20 0.43
ENPP1 P22413 1/20 0.43
CTRC Q99895 1/20 0.43
PLA2G1B P04054 1/20 0.43
PLA2G5 P39877 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9547776 0.96 MEN1 (0.48) PLA2G10PLA2G2AMEN1RAB9AKMT2A
SCHEMBL10333967 0.92 RARB (0.50) RARBRAB9ALTA4H
SCHEMBL9547745 0.90 ACACB (0.51) ACACBFFAR1ENPP3ENPP1
SCHEMBL9547848 0.88 FFAR1 (0.46) RARBMEN1KMT2AFFAR1
SCHEMBL9126836 0.85 ALOX5 (0.50) PLA2G10PLA2G2AMEN1RAB9AKMT2A
SCHEMBL9547791 0.85 ALOX5 (0.49) MEN1RAB9AKMT2ASMN1; SMN2
SCHEMBL9547852 0.85 APP (0.48) RAB9ASMN1; SMN2FFAR1
SCHEMBL9547813 0.82 ACACB (0.43) PLA2G10PLA2G2AACACBFFAR1ENPP3
SCHEMBL9547815 0.82 ACACB (0.43) PLA2G10PLA2G2AACACBFFAR1ENPP3
SCHEMBL9547817 0.82 ACACB (0.43) PLA2G10PLA2G2AACACBFFAR1ENPP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0288297-B1 OPTICALLY ACTIVE BENZENE DERIVATIVES AND PROCESS FOR PREPARATION THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1993-03-17 EP disclosed
US-4985590-A Optically active benzene derivatives and process for preparation thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-01-15 US disclosed