SCHEMBL9564243

SCHEMBL9564243

CCCC(=O)Nc1nc(NC(=O)CCC)nc(NC(=O)CCC)n1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADORA1 P30542 9/20 0.59
ADORA3 P0DMS8 3/20 0.57
ADORA2A P29274 5/20 0.54
TP53 P04637 1/20 0.50
KDM4E B2RXH2 1/20 0.49
MAPT P10636 1/20 0.49
HDAC3 O15379 1/20 0.48
HDAC1 Q13547 1/20 0.48
HDAC2 Q92769 1/20 0.48
HDAC8 Q9BY41 1/20 0.48
HDAC6 Q9UBN7 1/20 0.48
ALDH1A1 P00352 2/20 0.47
RXFP1 Q9HBX9 1/20 0.47
CYP2C19 P33261 2/20 0.47
CTSD P07339 1/20 0.46
MAPK1 P28482 1/20 0.46
MEN1 O00255 1/20 0.45
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
KMT2A Q03164 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19288153 0.94 ADORA1 (0.54) ADORA1ADORA3ADORA2ATP53KDM4E
SCHEMBL17451137 0.90 ADORA1 (0.51) ADORA1ADORA3ADORA2ATP53KDM4E
SCHEMBL14154032 0.87 SMN1; SMN2 (0.50) ADORA1ADORA3ADORA2ATP53KDM4E
SCHEMBL3301236 0.86 ADORA1 (0.51) ADORA1ADORA3ADORA2ATP53KDM4E
SCHEMBL9564261 0.85 KMT2A (0.57) ADORA1ALDH1A1MAPK1MEN1NPC1
SCHEMBL13227316 0.83 KMT2A (0.55) ADORA1ALDH1A1MAPK1MEN1NPC1
SCHEMBL1666455 0.82 ADORA1 (0.46) ADORA1ADORA3ADORA2AMEN1RAB9A
SCHEMBL6578953 0.81 ADORA1 (0.42) ADORA1ADORA3ADORA2AKDM4EMAPT
SCHEMBL3295899 0.80 ADORA3 (0.56) ADORA1ADORA3ADORA2ATP53KDM4E
SCHEMBL19154145 0.79 LMNA (0.63) ADORA1ADORA3ADORA2ATP53MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023199881-A1 METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND RESIST UNDERLAYER FILM FORMING COMPOSITION JSR株式会社 2023-10-19 WO disclosed
US-7179872-B2 Chain transfer agents for RAFT polymerization in aqueous media UNIVERSITY OF SOUTHERN MISSISSIPPI (US) 2007-02-20 US disclosed
EP-0541966-A2 Process for preparing amide derivatives from halomines and acid halides AMERICAN CYANAMID COMPANY (US) 1993-05-19 EP disclosed