SCHEMBL957487

SCHEMBL957487

O=C1C2CC3CC1CC(C(=O)OC(C(=O)[O-])C(F)(F)CS(=O)(=O)O)(C3)C2.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 4/20 0.34
CYP19A1 P11511 4/20 0.34
RECQL P46063 1/20 0.32
ALDH1A1 P00352 1/20 0.31
GAA P10253 1/20 0.31
KDM4E B2RXH2 1/20 0.31
GABBR2 O75899 1/20 0.30
GABRB1 P18505 1/20 0.30
GABRB2 P47870 1/20 0.30
GABBR1 Q9UBS5 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL956925 0.82 ALDH1A1 (0.31) CYP17A1CYP19A1ALDH1A1GAAKDM4E
SCHEMBL957486 0.79 ALDH1A1 (0.39) CYP17A1CYP19A1RECQLALDH1A1GAA
SCHEMBL1398375 0.77 ALDH1A1 (0.37) CYP17A1CYP19A1RECQLALDH1A1GAA
SCHEMBL953661 0.76 KDM4E (0.35) CYP17A1CYP19A1RECQLALDH1A1GAA
SCHEMBL956923 0.76 ALDH1A1 (0.39) CYP17A1CYP19A1RECQLALDH1A1GAA
SCHEMBL955212 0.74 CYP17A1 (0.36) CYP17A1CYP19A1RECQLALDH1A1GAA
SCHEMBL24361043 0.72 CYP17A1 (0.41) CYP17A1CYP19A1RECQLALDH1A1GAA
SCHEMBL955213 0.71 ALDH1A1 (0.36) CYP17A1CYP19A1RECQLALDH1A1GAA
SCHEMBL957911 0.71 MEN1 (0.36) CYP17A1CYP19A1ALDH1A1GAAKDM4E
SCHEMBL1462092 0.71 CYP17A1 (0.40) CYP17A1CYP19A1RECQLALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8609889-B2 Photoacid generator, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-12-17 US disclosed
US-20110003247-A1 PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-01-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110003247-A1 PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS GRHPR, GLRA3, GLRA1 CYP17A1 2703/4885CYP19A1 2427/4885RECQL 3016/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.