Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | CYP17A1 | P05093 | 4/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 4/20 | 0.30 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.30 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.30 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.30 |
| ▸ | GABBR1 | Q9UBS5 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL953661 | 0.94 | KDM4E (0.35) | ALDH1A1GAAKDM4ECYP17A1CYP19A1 | |
| SCHEMBL957911 | 0.88 | MEN1 (0.36) | ALDH1A1GAAKDM4ECYP17A1CYP19A1 | |
| SCHEMBL957487 | 0.82 | CYP17A1 (0.34) | ALDH1A1GAAKDM4ECYP17A1CYP19A1 | |
| SCHEMBL956923 | 0.81 | ALDH1A1 (0.39) | ALDH1A1GAAKDM4ECYP17A1CYP19A1 | |
| SCHEMBL23559488 | 0.76 | EPHX2 (0.35) | GAACYP17A1CYP19A1 | |
| SCHEMBL18133301 | 0.76 | EPHX2 (0.35) | GAACYP17A1CYP19A1 | |
| SCHEMBL6448541 | 0.76 | EPHX2 (0.35) | GAACYP17A1CYP19A1 | |
| SCHEMBL1398375 | 0.75 | ALDH1A1 (0.37) | ALDH1A1GAAKDM4ECYP17A1CYP19A1 | |
| SCHEMBL501575 | 0.74 | KDM4E (0.38) | ALDH1A1GAAKDM4ECYP17A1CYP19A1 | |
| SCHEMBL14769657 | 0.74 | TSHR (0.36) | GAACYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| US-20110003247-A1 | PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110003247-A1 | PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | GRHPR, GLRA3, GLRA1 | ALDH1A1 2589/4885GAA 903/4885KDM4E 3542/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.