⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18916912 | 0.86 | LMNA (0.33) | — | |
| SCHEMBL960686 | 0.81 | — | — | |
| SCHEMBL183781 | 0.79 | THRB (0.50) | — | |
| SCHEMBL141448 | 0.76 | ALDH1A1 (0.44) | — | |
| SCHEMBL333253 | 0.76 | — | — | |
| SCHEMBL28278529 | 0.74 | ALDH1A1 (0.43) | — | |
| SCHEMBL4445988 | 0.73 | THRB (0.41) | — | |
| SCHEMBL396937 | 0.73 | — | — | |
| SCHEMBL11704229 | 0.73 | THRB (0.32) | — | |
| SCHEMBL8994872 | 0.73 | THRB (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | claimed |
| US-10589494-B2 | Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window | FUJIFILM CORPORATION (JP) | 2020-03-17 | — | — | US | disclosed |
| EP-3340252-A1 | ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| EP-3340253-A1 | UV-RESISTANT ELECTRODE ASSEMBLY | Solvay SA (BE) | 2018-06-27 | — | — | EP | disclosed |
| US-20180079917-A1 | HEAT INSULATION PAINT | FUJIFILM CORPORATION (JP) | 2018-03-22 | — | — | US | disclosed |
| US-20170320302-A1 | FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW | FUJIFILM CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-20150004327-A1 | CONDUCTIVE MEMBER AND METHOD FOR MANUFACTURING SAME | FUJIFILM CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-20140069488-A1 | CONDUCTIVE MEMBER, METHOD OF PRODUCING THE SAME, TOUCH PANEL, AND SOLAR CELL | FUJIFILM CORPORATION (JP) | 2014-03-13 | — | — | US | disclosed |
| US-20140048131-A1 | CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL | FUJIFILM CORPORATION (JP) | 2014-02-20 | — | — | US | disclosed |
| US-20140034360-A1 | CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL | FUJIFILM CORPORATION (JP) | 2014-02-06 | — | — | US | disclosed |
| US-20110000658-A1 | HYDROPHILIC MEMBER | FUJIFILM CORPORATION (JP) | 2011-01-06 | — | — | US | disclosed |
| EP-2239137-A1 | HYDROPHILIC MEMBERS | FUJIFILM Corporation (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20050124747-A1 | Coating composition for ink-jet recording medium and ink-jet recording medium | DEUTSCHE BANK AG, NEW YORK BRANCH, AS COLLATERAL AGENT | 2005-06-09 | — | — | US | disclosed |
| EP-1470928-A1 | COATING COMPOSITION FOR INK-JET RECORDING MEDIUM AND INK-JET RECORDING MEDIUM | Clariant International Ltd. (CH) | 2004-10-27 | — | — | EP | disclosed |
| EP-0989162-A1 | THERMOPLASTIC RESIN COMPOSITION, WATER-BASED COMPOSITION, HEAT-SENSITIVE PRESSURE-SENSITIVE ADHESIVE, AND HEAT-SENSITIVE SHEET | Daicel Chemical Industries, Ltd. (JP) | 2000-03-29 | — | — | EP | disclosed |
| EP-0989168-A1 | Water-based coating composition | Daicel Chemical Industries, Ltd. (JP) | 2000-03-29 | — | — | EP | disclosed |