SCHEMBL959989

SCHEMBL959989

C=C(C)[Si](OCCCC)(OCCCC)OCCCC

nearest known ligand 0.39

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39
TSHR P16473 4/20 0.36
ADRB2 P07550 1/20 0.35
ADRB1 P08588 1/20 0.35
ADRB3 P13945 1/20 0.35
HPGD P15428 1/20 0.34
ATM Q13315 1/20 0.32
CYP3A4 P08684 1/20 0.31
CES2 O00748 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6513370 0.91 TSHR (0.47) TSHRHPGDCES2
SCHEMBL6509487 0.91 TSHR (0.47) TSHRHPGDCES2
SCHEMBL6512425 0.91 TSHR (0.47) TSHRHPGDCES2
SCHEMBL7775320 0.91 TSHR (0.47) TSHRHPGDCES2
SCHEMBL28450044 0.85 TSHR (0.30) TSHR
SCHEMBL6510887 0.79 ALDH1A1 (0.38) ALDH1A1TSHRADRB2ADRB1ADRB3
SCHEMBL962647 0.79 ALDH1A1 (0.38) ALDH1A1TSHRADRB2ADRB1ADRB3
SCHEMBL28437440 0.77 ALDH1A1 (0.37) ALDH1A1TSHRADRB2ADRB1ADRB3
SCHEMBL2507515 0.76 TSHR (0.44) ALDH1A1TSHRADRB2ADRB1ADRB3
SCHEMBL28618162 0.74 ALDH1A1 (0.39) ALDH1A1TSHRHPGDATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
US-10589494-B2 Far infrared reflective film, dispersion for forming far infrared reflective film, manufacturing method of far infrared reflective film, far infrared reflective glass, and window FUJIFILM CORPORATION (JP) 2020-03-17 US disclosed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP disclosed
US-20180079917-A1 HEAT INSULATION PAINT FUJIFILM CORPORATION (JP) 2018-03-22 US disclosed
US-20170320302-A1 FAR INFRARED REFLECTIVE FILM, DISPERSION FOR FORMING FAR INFRARED REFLECTIVE FILM, MANUFACTURING METHOD OF FAR INFRARED REFLECTIVE FILM, FAR INFRARED REFLECTIVE GLASS, AND WINDOW FUJIFILM CORPORATION (JP) 2017-11-09 US disclosed
US-20150004327-A1 CONDUCTIVE MEMBER AND METHOD FOR MANUFACTURING SAME FUJIFILM CORPORATION (JP) 2015-01-01 US disclosed
US-20140048131-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-20 US disclosed
US-20140034360-A1 CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL FUJIFILM CORPORATION (JP) 2014-02-06 US disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
US-20050124747-A1 Coating composition for ink-jet recording medium and ink-jet recording medium DEUTSCHE BANK AG, NEW YORK BRANCH, AS COLLATERAL AGENT 2005-06-09 US disclosed
EP-1470928-A1 COATING COMPOSITION FOR INK-JET RECORDING MEDIUM AND INK-JET RECORDING MEDIUM Clariant International Ltd. (CH) 2004-10-27 EP disclosed
EP-1114734-A1 RESIN COMPOSITION FOR INK-JET RECORDING SHEET AND RECORDING SHEET MADE WITH THE SAME DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) 2001-07-11 EP disclosed
EP-0989162-A1 THERMOPLASTIC RESIN COMPOSITION, WATER-BASED COMPOSITION, HEAT-SENSITIVE PRESSURE-SENSITIVE ADHESIVE, AND HEAT-SENSITIVE SHEET Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed
EP-0989168-A1 Water-based coating composition Daicel Chemical Industries, Ltd. (JP) 2000-03-29 EP disclosed