SCHEMBL9609286

SCHEMBL9609286

CN(S(=O)(=O)C(F)(F)C(F)F)S(=O)(=O)C(F)(F)C(F)(F)S(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4366853 0.71
SCHEMBL9609356 0.70 ALDH1A1 (0.31)
SCHEMBL576102 0.69 ALDH1A1 (0.33)
SCHEMBL321209 0.67 ALDH1A1 (0.39)
SCHEMBL3297818 0.67 ALDH1A1 (0.32)
SCHEMBL301944 0.67 ALDH1A1 (0.47)
Hydrochloric Acid SCHEMBL11271021 0.65 ALDH1A1 (0.38)
SCHEMBL10127906 0.65 CA1 (0.33)
SCHEMBL357194 0.65 ALDH1A1 (0.38)
Water SCHEMBL9500989 0.65 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120135348-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-05-31 US disclosed